2012
DOI: 10.1016/j.tsf.2012.09.058
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Electroless deposition of Au, Pt, or Ru metallic layers on CdZnTe

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Cited by 16 publications
(22 citation statements)
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“…Electroless gold contacts on Cd(Zn)Te have been extensively investigated before, with characterization methods such as Rutherford backscattering spectroscopy (RBS) [12][13][14], x-ray photoelectron spectroscopy (XPS) [15] and Auger electron spectroscopy (AES) [16] used to probe the MS interface formed during the deposition process. The current work aims to build on these previous studies by introducing a range of complementary materials characterization techniques, which when applied together, provide electrical, structural and detailed chemical information over a range of length scales.…”
Section: Introductionmentioning
confidence: 99%
“…Electroless gold contacts on Cd(Zn)Te have been extensively investigated before, with characterization methods such as Rutherford backscattering spectroscopy (RBS) [12][13][14], x-ray photoelectron spectroscopy (XPS) [15] and Auger electron spectroscopy (AES) [16] used to probe the MS interface formed during the deposition process. The current work aims to build on these previous studies by introducing a range of complementary materials characterization techniques, which when applied together, provide electrical, structural and detailed chemical information over a range of length scales.…”
Section: Introductionmentioning
confidence: 99%
“…A tetrachloroauric(III) acid solution with a HAuCl 4 to H 2 0/HCl ratio of 1 : 25 was used for the electroless deposition [22,23,33]. The electroless reaction is dominated by the removal of cadmium rather than tellurium from the CdZnTe surface.…”
Section: Sample Preparationmentioning
confidence: 99%
“…This is due to the greater standard potential, ΔE 0 , of the reaction with cadmium. The two competing reactions are stated in equations (1) and (2) [22]. A temperature controlled hot plate or ice bath was used to maintain the solution at the desired temperature, from 0 to 40 °C.…”
Section: Sample Preparationmentioning
confidence: 99%
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