Electrodeposition, characterization and photo electrochemical properties of CdSe and CdTe

Electroplating of Semiconductor Materials for Applications in Large Area Electronics: A Review

“…For the three-electrode configuration, the potential difference is measured across the working and the reference electrodes, while the measured current is between the working and the counter electrodes. In general, other factors such as the pH of the electrolyte [18], applied deposition potential [13,14], deposition temperature [19], stirring rate [20], deposition current density, duration of deposition and thickness [21], underlying substrate [22], and concentration of ions in the deposition electrolyte [18] affects the electrodeposition process and the properties of the deposited layers. Recent publications have demonstrated the similarities between electrodeposited semiconductors using three-electrode and two-electrode electroplating configurations [23,24].…”

STRUCTURAL AND OPTICAL PROPERTIES OF CdTe THIN FILMS OBTAINED BY ELECTRODEPOSITION

“…Figure 1 shows that cadmium starts to deposit at cathode voltage of -0.90 V, while the cathode voltage of -1.4 V plateau occurs and therefore the latter was elected as the voltage for the electrodeposition of CdTe film. In fact, during deposition voltage of -1.4 V, a reduction of Cd 2+ and Te 4+ ions at the cathode occurs, and, as a result, a CdTe film starts creating on the cathode [25]. The crystal structure and composition of CdTe thin films were determined by x-ray diffraction spectra (Figure 2), which showed that the films obtained at 90 o C are nanocrystalline with cubic structure, while the annealed films are polycrystalline with a cubic structure.…”

“…The voltage between the working electrode (SnO2 film) and the counter electrode (graphite) was changing from +1.82 V to -1.82 V, at a scan rate of 40 mV/s [4], [25]. Figure 1 shows that cadmium starts to deposit at cathode voltage of -0.90 V, while the cathode voltage of -1.4 V plateau occurs and therefore the latter was elected as the voltage for the electrodeposition of CdTe film.…”

CdTe films grown using a rotating sublimate vapor effusion source in glancing angle deposition mode

“…However, one major problem associated with the fabrication of a CdTe solar cell is the difficulty of producing CdTe films with high crystallinity. Polycrystalline CdTe films have been deposited by several techniques including electro-deposition [6], close-spaced sublimation (CSS) [7,8], molecular beam epitaxy [9], thermal evaporation [10] and sputtering [11]. Additionally CdTe nano-arrays have been produced with chemical bath deposition and electrochemical deposition [12,13].…”