Electrodeposition and Photoelectrocatalytic Activity of ZnO Films on AISI 304 Type Steel

Šulčiūtė, Agnė; Valatka, Eugenijus

doi:10.5755/j01.ms.18.4.3089

Cited by 6 publications

(4 citation statements)

References 40 publications

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“…A further increase in observed currents at a negative potential of -0.90 V can be associated mainly with water decomposition process which releases molecular hydrogen and hydroxide ions [34]. Some amount of hydroxyl OHions can be supplied through the hydrolysis of acetate anion [35] additionally but in near-electrode region its concentration higher, obviously. Hydroxide anions are responsible for zinc oxide deposition onto the ITO substrates according to the following principal Eq.…”

Section: Resultsmentioning

confidence: 98%

Electrochemicaly formed ZnO and Au/ZnO opal films

et al. 2020

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ZnO inverse opal films were synthesized electrochemically using aqueous and non-aqueous zinc acetate electrolytes and ITO deposited polystyrene opal matrices. The following thermal oxidation in air was performed for further application in optoelectronics. The overall composition and deposition potentials varied to reach uniform porous films with opal structure. Most uniform photonic film of ZnO with zincite structure has been deposited from DMSO electrolyte. Photoluminescence spectra of the ZnO coverages showed more complex spectra for precipitates sedimented from aqueous baths than from DMSO. Less deficient films of opal ZnO films deposited from DMSO demonstrated lower scattering effect compared to coverages deposited from aqueous electrolytes. Magnetron sputtering was applied for Au/ZnO composite film formation. The optical spectra of the Au/ZnO composite coverages correlate to spectra of uniform Au opal films.

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Section: Resultsmentioning

confidence: 98%

Electrochemicaly formed ZnO and Au/ZnO opal films

et al. 2020

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“…Ph Eur acetone for analysis and dried under atmosphere condition. The difference of electrodeposition method in this research work as compared to previous researches is the Zn substrate used, whereas previous researches used GaN substrate [ 23 ], Si substrate [ 24 , 65 , 66 , 67 ], steel substrate [ 25 , 68 ], FTO-coated glass [ 26 ], ITO-coated glass [ 6 , 69 ], and F-doped SnO 2 coated glass [ 70 , 71 , 72 , 73 , 74 ]. In addition, electrodeposition method in this research work is template-free as compared to previous researches that used alumina membrane templates or anodic alumina template (AAM) [ 75 , 76 ].…”

Section: Methodsmentioning

confidence: 99%

“…ZnO nanorods can be formed from sol-gel method [ 3 , 4 ], hydrothermal method [ 5 , 6 , 7 , 8 , 9 , 10 ], solvothermal method [ 11 , 12 , 13 , 14 ], chemical vapor deposition (CVD) method [ 15 , 16 , 17 , 18 ], atomic layer deposition (ALD) method [ 19 , 20 , 21 , 22 ], electrodeposition method [ 23 , 24 , 25 , 26 ], and other methods. However, due to several advantages, electrodeposition method has been chosen for the formation of ZnO nanorods in this research work.…”

Section: Introductionmentioning

confidence: 99%

Efficient Solar-Induced Photoelectrochemical Response Using Coupling Semiconductor TiO2-ZnO Nanorod Film

et al. 2016

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Efficient solar driven photoelectrochemical (PEC) response by enhancing charge separation has attracted great interest in the hydrogen generation application. The formation of one-dimensional ZnO nanorod structure without bundling is essential for high efficiency in PEC response. In this present research work, ZnO nanorod with an average 500 nm in length and average diameter of about 75 nm was successfully formed via electrodeposition method in 0.05 mM ZnCl2 and 0.1 M KCl electrolyte at 1 V for 60 min under 70 °C condition. Continuous efforts have been exerted to further improve the solar driven PEC response by incorporating an optimum content of TiO2 into ZnO nanorod using dip-coating technique. It was found that 0.25 at % of TiO2 loaded on ZnO nanorod film demonstrated a maximum photocurrent density of 19.78 mA/cm2 (with V vs. Ag/AgCl) under UV illumination and 14.75 mA/cm2 (with V vs. Ag/AgCl) under solar illumination with photoconversion efficiency ~2.9% (UV illumination) and ~4.3% (solar illumination). This performance was approximately 3–4 times higher than ZnO film itself. An enhancement of photocurrent density and photoconversion efficiency occurred due to the sufficient Ti element within TiO2-ZnO nanorod film, which acted as an effective mediator to trap the photo-induced electrons and minimize the recombination of charge carriers. Besides, phenomenon of charge-separation effect at type-II band alignment of Zn and Ti could further enhance the charge carrier transportation during illumination.

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“…Al:ZnO NRs are one of the commonly used nanostructures for various devices [3 -5]. These NRs can be grown by RF sputtering [16,17], the sol-gel method [18], dip-coating [19], electrochemical deposition [20], the hydrothermal method [21], and chemical vapor deposition [22], etc. In this work, we used the hydrothermal method for the growth of the Al:ZnO NRs.…”

Section: Introduction mentioning

confidence: 99%

Studies of Surface Electrical Properties of Al doped ZnO Nanorods by STM

Singh¹,

Vyas²,

Chakrabarti³

et al. 2017

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Pure and aluminum (Al) doped ZnO (Al:ZnO) nanorods (NRs) were deposited on silicon substrates by the hydrothermal method. The Al composition was kept at 2 % and 5 % for the Al:ZnO NR samples. The surface morphology and structural properties of the pure and Al:ZnO NRs were characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD), respectively. The XRD study revealed the hexagonal phase of the ZnO with (101), (002) and (100) peaks and it also revealed that the major orientation of ZnO NRs was along the (002) planes. The SEM micrographs showed perfectly grown ZnO NRs with hexagonal shaped tips. The electrical characterization of the pure and Al:ZnO NR thin film surface was done by scanning tunneling microscopy (STM). Local electron spectroscopy was conducted to measure the tunneling current with respect to the applied bias. The n-type behavior and bandgap of the pure and Al:ZnO NRs were confirmed from the dI/dV-V characteristics. These studies are of fundamental importance for the fabrication of pure and Al:ZnO NR based nanodevices.

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Electrodeposition and Photoelectrocatalytic Activity of ZnO Films on AISI 304 Type Steel

Cited by 6 publications

References 40 publications

Electrochemicaly formed ZnO and Au/ZnO opal films

Electrochemicaly formed ZnO and Au/ZnO opal films

Efficient Solar-Induced Photoelectrochemical Response Using Coupling Semiconductor TiO2-ZnO Nanorod Film

Studies of Surface Electrical Properties of Al doped ZnO Nanorods by STM

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