2015
DOI: 10.1016/j.mssp.2014.09.043
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Electrochromic properties of radio frequency magnetron sputter deposited mixed Nb2O5:MoO3 (95:5) thin films cycled in H+ and Li+ ions

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Cited by 30 publications
(14 citation statements)
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“…The observed roughness values are consisted with values reported for both amorphous Nb2O5 [25,50] and Mo doped Nb2O5 [29,30,51]. The increase in roughness, alongside increases in WMo, can be correlated directly with decreases in PO2 from 0.7 to 0.5 mTorr.…”
Section: Measurement Of the Films' Surface Roughness As Listed Insupporting
confidence: 77%
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“…The observed roughness values are consisted with values reported for both amorphous Nb2O5 [25,50] and Mo doped Nb2O5 [29,30,51]. The increase in roughness, alongside increases in WMo, can be correlated directly with decreases in PO2 from 0.7 to 0.5 mTorr.…”
Section: Measurement Of the Films' Surface Roughness As Listed Insupporting
confidence: 77%
“…For WMo<100 W, both n(λ) and k(λ) demonstrate behaviors analogous to dielectric, wide band gap semiconductors, with k(λ) < 0.01 for λ > 400 nm. For WMo=100 W, a marked increase in k, where k550=0.02, is noted as a result of energy loss via electron-impurity and electron-electron interaction related to the presence of oxygen vacancies associated with the presence of 3% of the Mo 5+ cation, as measured via XPS (Figure 3, Figure 4) [30,54]. WMo=100 W, where n increases slightly as a potential result of an increase in electronic polarizability or density attributed to the formation of significant quantities of the Mo 5+ cation [56].…”
Section: Measurement Of the Films' Surface Roughness As Listed Inmentioning
confidence: 94%
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“…44 In addition, the variation in intensity of photoluminescence emission peak with Cu dopant is due to the change in surface state density. 45 11. Plot of (n 2 À 1) À1 vs (h) 2 of pure and Cu doped thin films.…”
Section: Photoluminescence Studymentioning
confidence: 99%