The optimum conditions for electrodeposition of compact, smooth and adherent Ti films in LiF-LiCl-Li3TiF6 at 823 K were investigated. The Li3TiF6 was formed in situ in the melt via comproportionation reaction between Li2TiF6 and Ti powder. The solubility of Li3TiF6 was confirmed to be higher than 7.1 mol% by cyclic voltammetry and ICP-AES measurement. Galvanostatic electrolysis was conducted on Ni plate substrates at various concentrations of Li3TiF6 (0.55, 2.6, 7.1 mol%) and cathodic current density (50-1200 mA cm −2). Ti films with smoother surface were obtained at higher Li3TiF6 concentration and lower current density. In the present study, the smoothest surface Ti films were obtained at 7.1 mol% of Li3TiF6 and 50 mA cm −2 of cathodic current density.