2015 31st Thermal Measurement, Modeling &Amp; Management Symposium (SEMI-THERM) 2015
DOI: 10.1109/semi-therm.2015.7100156
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Electro-thermal modeling of trench-isolated SiGe HBTs using TCAD

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Cited by 9 publications
(7 citation statements)
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“…Indeed, the heat diffusion process in those technologies is confined by these isolations. Since IHP technology does not feature DTI, it leads to a reduced thermal budget [11] and a more efficient heat diffusion through the device which depends mainly on the value of the heat diffusion angle as presented fig.3 (a) and (b).…”
Section: B Single-finger Transistor Analysismentioning
confidence: 99%
“…Indeed, the heat diffusion process in those technologies is confined by these isolations. Since IHP technology does not feature DTI, it leads to a reduced thermal budget [11] and a more efficient heat diffusion through the device which depends mainly on the value of the heat diffusion angle as presented fig.3 (a) and (b).…”
Section: B Single-finger Transistor Analysismentioning
confidence: 99%
“…Thermal issues have become a serious concern in SiGe HBTs due to the concurrent impact of the following factors: (i) the shrinking of the intrinsic device has induced a growth in power density within the base-collector SCR for a given bias condition; (ii) the trench isolation -exploited to reduce parasitics, crosstalk, and increase f MAX -limits the heat spreading since trenches are filled with materials suffering from low thermal conductivity [Rie05,dAl10,You11,Pet15]. This mechanism is even exacerbated by lateral scaling, which results in a horizontal reduction of the Si volume embraced by trenches; (iii) HBTs are operated at high current densities to boost the frequency performance, which entails a further increase in dissipated power density [Cre13].…”
Section: Thermal Effectsmentioning
confidence: 99%
“…(5.20) where k Si and k Ge are the thermal conductivities of pure Si and Ge, respectively, and c k is a bowing factor equal to 2.8 W/mK. Due to the k lowering imposed by Equation (5.20), the SiGe layer behaves as a barrier for the heat flow from the heat source to the emitter [Pet15]. The thermal conductivity is also adversely impacted by doping due to the enhanced phonon-impurity scattering, as experimentally observed in [Sla64,McC05,Lee12]; a compact formulation to account for this effect is [Lee12]:…”
Section: Thermal Simulationmentioning
confidence: 99%
“…Unfortunately, thermal issues have become a serious concern in SiGe HBTs due to the concurrent impact of the following factors: (i) the intrinsic device shrinking has induced a growth in power density within the base-collector depletion region; (ii) the trench isolationexploited to reduce parasitics and increase f maxgives rise to a limited heat spreading since trenches are filled with low conductivity materials [6][7][8][9]. This mechanism is even exacerbated by the lateral scaling, which results in a horizontal reduction of the Si volume embraced by trenches; (iii) HBTs are operated at high current densities to boost the frequency performance, which entails a further increase in dissipated power density [2].…”
Section: Introductionmentioning
confidence: 99%