2013
DOI: 10.1111/jace.12201
|View full text |Cite
|
Sign up to set email alerts
|

Electrical Properties of Amorphous BaTi4O9 Films Grown on Cu/Ti/SiO2/Si Substrates Using RF Magnetron Sputtering

Abstract: Amorphous BaTi4O9 (BT4) films for use as capacitors embedded in PCB substrates were grown on Cu electrodes at low temperatures (≤ 200°C). The dielectric constant (k) of the amorphous BT4 film grown at room temperature (RT) was 38, and its dissipation factor was 3.2% at 100 kHz. A similar k value was obtained at radio‐frequency ranges, with a quality factor of 143 at 1.0 GHz. The films showed a capacitance density of 200 nF/cm2, a temperature coefficient of capacitance of 296 ppm/°C at 75 kHz, and a breakdown v… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

1
1
0

Year Published

2013
2013
2016
2016

Publication Types

Select...
4

Relationship

2
2

Authors

Journals

citations
Cited by 4 publications
(2 citation statements)
references
References 14 publications
1
1
0
Order By: Relevance
“…For the Pt/NKN/Pt/PI device, a Pt top electrode was deposited on the rough surface of the NKN film at RT without postmetal annealing, indicating that adhesion between the Pt top electrode and the NKN film was poor as compared with that of the NKN film grown on the Pt–Si substrate. Therefore, the degraded Pt/NKN interface could be responsible for the deterioration of the dielectric and electric properties of the transferred NKN film; similar results have been observed for the other dielectric films …”
Section: Resultssupporting
confidence: 75%
“…For the Pt/NKN/Pt/PI device, a Pt top electrode was deposited on the rough surface of the NKN film at RT without postmetal annealing, indicating that adhesion between the Pt top electrode and the NKN film was poor as compared with that of the NKN film grown on the Pt–Si substrate. Therefore, the degraded Pt/NKN interface could be responsible for the deterioration of the dielectric and electric properties of the transferred NKN film; similar results have been observed for the other dielectric films …”
Section: Resultssupporting
confidence: 75%
“…At the high electric field, the current conduction mechanism can be known by linear correlation between ln(J/T 2 ) versus E 1/2 for the Schottky emission (SE) and ln(J/E) versus E 1/2 for the Poole-Frenkel emission (PFE) as shown in Fig. 3(c), where J is the current density, T is the temperature, and E is the electric field [12]. The slope of each plot is used to calculate γ value with the equation explained by Peng et al [13] as follows:…”
Section: Resultsmentioning
confidence: 99%