2016
DOI: 10.1088/0268-1242/31/11/114004
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Electrical characterization of chemical and dielectric passivation of InAs nanowires

Abstract: The native oxide at the surface of III-V nanowires, such as InAs, can be a major source of charge noise and scattering in nanowire-based electronics, particularly for quantum devices operated at low temperatures. Surface passivation provides a means to remove the native oxide and prevent its regrowth. Here, we study the effects of surface passivation and conformal dielectric deposition by measuring electrical conductance through nanowire field effect transistors treated with a variety of surface preparations. … Show more

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Cited by 15 publications
(15 citation statements)
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“…Under a vacuum, we expect the hysteresis to be dominated by charge trapping at the SiO 2 /nanowire interface. Our results with (NH 4 ) 2 S x enable us to address the question recently raised by Holloway et al regarding whether (NH 4 ) 2 S x might be a good alternative to 1-octadecanethiol (ODT) for nanowire gate passivation. The data in Figure d–g suggests this would not be the case, which is consistent with our earlier work on GaAs also.…”
mentioning
confidence: 54%
“…Under a vacuum, we expect the hysteresis to be dominated by charge trapping at the SiO 2 /nanowire interface. Our results with (NH 4 ) 2 S x enable us to address the question recently raised by Holloway et al regarding whether (NH 4 ) 2 S x might be a good alternative to 1-octadecanethiol (ODT) for nanowire gate passivation. The data in Figure d–g suggests this would not be the case, which is consistent with our earlier work on GaAs also.…”
mentioning
confidence: 54%
“…31,32 Slow capture and emission processes are believed to originate from trap states residing in the amorphous native oxide at the InAs NW surface and possibly even the SiO 2 gate oxide due to the large activation energies (E b ∼ 0.1−1.37 eV) and small capture cross sections (σ 0 ∼ 10 −17 −10 −19 cm 2 ) found in these experiments. Additionally, passivation of the NW surface has shown to be effective in suppressing the hysteresis in InAs NW FETs, 24,33 further supporting the claim that slow trapping processes originate from traps at the InAs NW surface and native oxide. Suppression of the G−V g hysteresis has been observed in our InAs NWs as a result of sulfur-based surface passivation and is to be reported in a later study.…”
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confidence: 73%
“…While data points are too few for statistical comparison, it is a useful demonstration that nanowires can be successfully integrated with the multiplexer without any reduction in quality, since parameters compare favorably to nonmultiplexed WZ nanowires, 69 which showed V t = −7.4 V, on/off ratio = 3.4 dec, SS = 2320 mV dec −1 , n = 4.7 × 10 17 cm −3 , and μ FE = 340 cm 2 V s −1 . These measurements were performed at room temperature, which accounts for the lower mobility and higher SS 71 compared to our devices. The carrier density is larger in our measurements since an ammonium sulfide etch is performed prior to contact deposition to remove native oxide.…”
Section: Resultsmentioning
confidence: 99%