2015
DOI: 10.1002/pssc.201510025
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Electrical characteristics of vapor deposited amorphous MoS2 two‐terminal structures and back gate thin film transistors with Al, Au, Cu and Ni‐Au contacts

Abstract: Amorphous molybdenum sulphide (a‐MoS2) thin films were deposited at near room temperature on oxidized silicon substrates and were electrically characterized with the use of two‐terminal structures and of back‐gated thin film transistors utilizing the substrate silicon as gate. Current‐voltage characteristics were extracted for various metals used as pads, showing significant current variations attributable to different metal‐sulphide interface properties and contact resistances, while the effect of a forming g… Show more

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Cited by 4 publications
(2 citation statements)
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References 16 publications
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“…That is to say, the contact between Ti/Au and the β-Ga 2 O 3 film still needs to be optimized. The same inference has been made on the back-gate a-MoS 2 thin film transistors (Kouvatsos et al, 2015).…”
Section: Resultssupporting
confidence: 57%
“…That is to say, the contact between Ti/Au and the β-Ga 2 O 3 film still needs to be optimized. The same inference has been made on the back-gate a-MoS 2 thin film transistors (Kouvatsos et al, 2015).…”
Section: Resultssupporting
confidence: 57%
“…Transition metal chalcogenides (TMCs) represent a highly promising class of materials with a wide range of applications. These materials exhibit exceptional optical, electrical, catalytic, and mechanical properties, making them suitable for numerous elds, including batteries, 1,2 supercapacitors, 3 , (photo)catalysis, [4][5][6][7][8] , (photo)transistors [9][10][11] and other optoelectronic devices. [12][13][14][15][16][17] One feature of TMCs is their band gap tunability, which makes them ideal for adjustable light absorption, e.g., serving as the photoactive layer in photovoltaic applications.…”
Section: Introductionmentioning
confidence: 99%