Efficient Chemical Mechanical Polishing of AISI 52100 Bearing Steel with TiSol-NH4 Dispersion-Based Slurries

Wu, Hualong; Jiang, Liang; Liu, Jinwei; Deng, Chenwei; Huang, Haifeng; Qian, Linmao

doi:10.1007/s11249-020-1274-4

Cited by 9 publications

(2 citation statements)

References 22 publications

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“…The slurry formulation needs to be optimized to improve polishing efficiency. In addition to BTA [104,105] and strong acid-base solutions [106], people use organic bases [107] or ethylenediamine [108] in the CMP slurry of steel. However, in fact, these chemical compositions can cause hazardous effects on the environment.…”

Section: Steelmentioning

confidence: 99%

A review: green chemical mechanical polishing for metals and brittle wafers

Liu¹,

Zhang²,

Wu³

et al. 2021

J. Phys. D: Appl. Phys.

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Chemical mechanical polishing (CMP) is the most effective technique to obtain global and local planarization of metal and brittle surfaces. Conventionally, CMP slurries contain strong acids, alkalis, or hazardous chemicals, which easily cause widespread environmental pollution and are harmful to the operators. It is a challenge to develop a novel green CMP slurry with eco-friendly and non-toxic compositions. Some substances with special structures contain versatile functional groups and have unique physical and chemical properties, including excellent chelating ability, ionization activity, biocompatibility and biodegradability, which have attracted the interest of CMP processing techniques. Therefore, researchers have begun to explore CMP slurries composed of environmentally friendly compositions. This review discussed the latest developments in the field of green CMP of metals and brittle wafers. The research on green CMP slurries was summarized and the future of the field was discussed.

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Section: Steelmentioning

confidence: 99%

A review: green chemical mechanical polishing for metals and brittle wafers

Liu¹,

Zhang²,

Wu³

et al. 2021

J. Phys. D: Appl. Phys.

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“…However, the investigation of the effect of -NH 2 functional groups of complexing agents on the CMP of GCr15 steel, a typical bearing steel, is still lacking. In our previous work, it was found that the organic base, highly likely a type of amine, in TiSol-NH 4 dispersion could serve as a complex agent to achieve efficient CMP of GCr15 steel [18]. Moreover, our preliminary experimental results reveal that, the MRR of GCr15 steel gradually decreases rather than increases when it is polished with TiSol-NH 4 dispersion and pH value increases from 5.0 to 7.0, which is apparently different from that of copper [16,17].…”

Section: Introductionmentioning

confidence: 99%

Exploring the role of −NH2 functional groups of ethylenediamine in chemical mechanical polishing of GCr15 bearing steel

Jiang

Zhong

et al. 2020

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Ethylenediamine with two −NH2 functional groups was used as a critical complexing agent in chemical mechanical polishing (CMP) slurries for a high carbon chromium GCr15 bearing steel (equivalent to AISI 52100). The polishing performance and corresponding mechanism of −NH2 functional groups were thoroughly investigated as a function of pH. It is revealed that, when polished with ethylenediamine and H2O2-based slurries, the material removal rate (MRR) and surface roughness Ra of GCr15 steel gradually decrease as pH increases. Compared with acidic pH of 4.0, at alkaline pH of 10.0, the surface film of GCr15 steel has much higher corrosion resistance and wear resistance, and thus the material removal caused by the pure corrosion and corrosion-enhanced wear are greatly inhibited, resulting in much lower MRR and Ra. Moreover, it is confirmed that a more protective composite film, consisting of more Fe3+ hydroxides/oxyhydroxides and complex compounds with −NH2 functional groups of ethylenediamine, can be formed at pH of 10.0. Additionally, the polishing performance of pure iron and a medium carbon 45 steel exhibits a similar trend as GCr15 steel. The findings suggest that acidic pH could be feasible for amine groups-based complexing agents to achieve efficient CMP of iron-based metals.

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