2009
DOI: 10.1016/j.jssc.2009.07.025
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Effects of substrate temperature on properties of ITO–ZnO composition spread films fabricated by combinatorial RF magnetron sputtering

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Cited by 27 publications
(20 citation statements)
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“…6,12,22 Therefore, careful engineering of materials made up of these elements with conduction s orbitals 14,23 can render them useful materials for TCOs applications. 26,33,[36][37][38][39][40][41] All IZTO films show optical transmittance over 80% in the visible region, indicating the comparable to or greater optoelectronic properties than that of the commercial ITO. 3,9,[23][24][25][26][27][28][29][30][31][32] The constituent compounds of IZTO, namely, ZnO and SnO 2 , have already been estimated to have low solubility in In 2 O 3 isolatedly, for example, 6 cation% for SnO 2 and o1 wt% for ZnO, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…6,12,22 Therefore, careful engineering of materials made up of these elements with conduction s orbitals 14,23 can render them useful materials for TCOs applications. 26,33,[36][37][38][39][40][41] All IZTO films show optical transmittance over 80% in the visible region, indicating the comparable to or greater optoelectronic properties than that of the commercial ITO. 3,9,[23][24][25][26][27][28][29][30][31][32] The constituent compounds of IZTO, namely, ZnO and SnO 2 , have already been estimated to have low solubility in In 2 O 3 isolatedly, for example, 6 cation% for SnO 2 and o1 wt% for ZnO, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…Zinc oxide nanostructures are extensively studied in the literature for its interesting photoconducting [6], electrical [7] and optical properties [8]. In addition, crucial role played by Zn(II) in pure ZnO and its mixed oxides in heterogeneous catalysis makes many organic reactions feasible.…”
Section: Introductionmentioning
confidence: 99%
“…The sputter guns are located at these locations to yield a thickness gradient in the deposited films and therefore produce a compositionally spread film when co-sputtered from both guns at the same time. 8 gases, and the Ar and O 2 gas flow rates were maintained at 24.8 sccm and 0.2 sccm, respectively. The process pressure was 0.17 Pa and the substrate temperature was room temperature.…”
Section: Methodsmentioning
confidence: 99%