Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition

Barve, S.A.; Jagannath,; Mithal, N.; Deo, M. N.; Biswas, A.; Mishra, R.; Kishore, R.; Bhanage, Bhalchandra M.; Gantayet, L.M.; Patil, D.S.

doi:10.1016/j.tsf.2010.12.004

Cited by 24 publications

(12 citation statements)

References 36 publications

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“…The modulus demonstrates the same trend as well as that of the hardness. Although many reports declared that the crystal phase or chemical bonds played the important role in the film hardness [4], in this work we found that the microstructure of the films give a more critical criterion for the mechanical properties of films. Due to the anisotropy of mechanical properties for columnar-like films, the films with (222) out-of-plane texture give the single crystal-like mechanical properties along the tip moving direction.…”

Section: Optical and Mechanical Propertiesmentioning

confidence: 47%

“…Briefly, owing to high chemical and thermal stability (melting point is up to~2349°C) [1,2], and its mechanical properties (high strength and fracture toughness) [3], yttrium oxide films and particles have been used in thermal or reaction barrier coatings [4] and oxide dispersion strengthened steels [5,6]. Particularly, due to the excellent optical and electric properties, including a wide transmittance range, high refractive index (~2), low absorption, large band gap (~5.4 eV), and high permittivity (~14-18) accompanied with a lattice match with Si and GaAs (for the cubic phase) and graphene (for the hexagonal phase), yttrium oxide thin films become one of the most interesting materials widely used in optical waveguides [7][8][9], and as an antireflective layer [10], or as a high efficiency phosphor by doping with other rare-earth elements [11,12], as well as one component of high-quality metal-oxide-semiconductor (MOS) based devices [13][14][15][16][17][18].…”

Section: Introductionmentioning

confidence: 99%

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Study on reactive sputtering of yttrium oxide: Process and thin film properties

Lei

Leroy²,

Dai

et al. 2015

Surface and Coatings Technology

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Section: Optical and Mechanical Propertiesmentioning

confidence: 47%

Section: Introductionmentioning

confidence: 99%

Study on reactive sputtering of yttrium oxide: Process and thin film properties

Lei

Leroy²,

Dai

et al. 2015

Surface and Coatings Technology

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“…XPS being a surface sensitive technique it probes few layers on the surface of the films. GIXRD [25] are not seen for all the films indicating that the nonstoichiometric nature of films as seen by XPS analysis is only a surface phenomena, the bulk being polycrystalline BCC structure. As stated earlier, semi-quantitative analysis is done here by considering only Y 3d peak.…”

Section: Discussionmentioning

confidence: 85%

“…Since moisture and carbon species are adsorbed on the surface of the film, quantitative analysis based on XPS from O 1s peak may not represent the actual bulk composition of films. Hence, semiquantitative analysis is done only by taking into consideration Y 3d peak [25]. Semiquantitative analysis from Y 3d peak indicate that the degree of stoichiometry of deposited phase on the surface of films is gradually increasing with bias ( Table 2).…”

Section: X-ray Photoelectron Spectroscopymentioning

confidence: 99%

RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition

Chopade

Barve

Raman

et al. 2013

Applied Surface Science

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a b s t r a c tYttrium oxide (Y 2 O 3 ) thin films have been deposited by radio frequency plasma assisted metal organic chemical vapor deposition (MOCVD) process using (2,2,6,6-tetramethyl-3,5-heptanedionate) yttrium (commonly known as Y(thd) 3 ) precursor in a plasma of argon and oxygen gases at a substrate temperature of 350 • C. The films have been deposited under influence of varying RF self-bias (−50 V to −175 V) on silicon, quartz, stainless steel and tantalum substrates. The deposited coatings are characterized by glancing angle X-ray diffraction (GIXRD), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry and scanning electron microscopy (SEM). GIXRD and FTIR results indicate deposition of Y 2 O 3 (BCC structure) in all cases. However, XPS results indicate nonstoichiometric cubic phase deposition on the surface of deposited films. The degree of nonstoichiometry varies with bias during deposition. Ellipsometry results indicate that the refractive index for the deposited films is varying from 1.70 to 1.83 that is typical for Y 2 O 3 . All films are transparent in the investigated wavelength range 300-1200 nm. SEM results indicate that the microstructure of the films is changing with applied bias. Results indicate that it is possible to deposit single phase cubic Y 2 O 3 thin films at low substrate temperature by RF plasma MOCVD process. RF self-bias that decides about the energy of impinging ions on the substrates plays an important role in controlling the texture of deposited Y 2 O 3 films on the substrates. Results indicate that to control the structure of films and its texture, it is important to control the bias on the substrate during deposition. The films deposited at high bias level show degradation in the crystallinity and reduction of thickness.

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“…9) Therefore, these devices require preparing films directly on a glass or an organic substrate. 10) Several methods have been used to prepare Y 2 O 3 :Eu 3+ films such as: magnetron sputtering, 11), 12) vacuum nano-imprint, 13) microwave electron cyclotron resonance plasma, 14) sputtering, 15) excimer-laser-assisted metal organic deposition, 16) chemical bath deposition, 17) CVD, 18), 19) electrodeposition 20), 21) or pulsed laser deposition. 22), 23) However, these techniques usually require expensive and complicated equipment setup.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and photoluminescent properties of Y2O3:Eu3+ thin films prepared from F127-containing solution

Ramírez

Domínguez

Medina-Velazquez

et al. 2014

J. Ceram. Soc. Japan

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Dense and transparent Y 2 O 3 :Eu 3+ films were prepared by the solgel process and dip-coating technique from an yttrium 24 pentanedionate, europium nitrate and a methanol solution modified with F127 pluronic acid, by incorporation of acetic acid as pH modifier and acetylacetone as sol stabilizer. It was evaluated the effect of the F127/Y molar relationship (0, 0.1, 0.2, 1.0, 1.2 and 5.0) on the structure and photoluminiscent properties of the derived thin films. After 3 dipping-cycles, XRD results showed that the F127-modified films began to crystallize at 600°C into the cubic structure, and from 800°C, was found that the presence of F127 changes the preferential orientation from a ©100ª orientation, for the non-modified sample, to a ©111ª orientation, for the modified ones. M-lines spectroscopy characterization showed that the maximum thickness of the films modified and annealed at 900°C was 1937 nm (µ = 4.87 g cm ¹3, © = 1.887), compared with the 881 nm (µ = 4.94 g cm ¹3, © = 1.907) for a non-modified sample. Differential thermal analysis (DTA) and infrared spectroscopy (FTIR) were carried out to evaluate the chemical and structural evolution of the xerogel formed during the annealing process. AFM micrographs showed smooth crack-free surface (Ra = 9.2 nm) on a F127/Y = 0.2 sample. Finally, the films presented a typical Eu 3+ reddish emission at 611 nm (D o ¼ 7 F 2 ), which was analyzed as function of the F127 pluronic content and the annealing temperature.

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Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition

Cited by 24 publications

References 36 publications

Study on reactive sputtering of yttrium oxide: Process and thin film properties

Study on reactive sputtering of yttrium oxide: Process and thin film properties

RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition

Synthesis and photoluminescent properties of Y<sub>2</sub>O<sub>3</sub>:Eu<sup>3+</sup> thin films prepared from F127-containing solution

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