Effects of periods on the evolution of microstructure and mechanical properties of multilayered Cu-W films during thermal annealing

Xue, Jiawei; Li, Yanhuai; Gao, Leiwen; Qian, Dong; Song, Zhongxiao; Xiao-hua, Wang; Zhu, Xiaodong; Chen, Jian

doi:10.1016/j.surfcoat.2019.125179

Cited by 5 publications

(3 citation statements)

References 45 publications

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“…In our previous studies, W-doped Ni/Ni 3 Al multilayers with an individual layer thickness of 40 nm showed significate hardness and wear resistance under the synergistic strengthening effect of the W alloying and multilayered structure [34,35]. Many reports reveal that the effects of the phase and interface microstructure are adjusted by the individual layer thicknesses on the strengthening of multilayer films composed of modulation layers [31,36,37]. However, the influence of the individual layer thicknesses on the microstructure and mechanical properties of as-sputtered Mo-W-doped Ni-based multilayer coatings is still unclear and is expected to be further improved.…”

Section: Introductionmentioning

confidence: 97%

Individual Layer Thickness Dependence of Microstructure and Mechanical Properties of Magnetron Sputtering Mo-W-Doped Ni/Ni3Al Multilayers

Zhang

Shao²,

Dai

et al. 2022

Coatings

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The mechanical properties of nanocrystalline pure Ni films are degraded due to grain coarsening with exposure for a long time in ambient. In order to further improve the mechanical properties of Ni-based thin films, as-sputtered Mo-W co-doped Ni/Ni3Al multilayered structures were constructed. When the individual layer thickness (h) is lower than 40 nm, both the average grain sizes and the crystallinity degrees are degraded, showing a tendency for the formation of the amorphous phase. With h = 40 nm, nano-twins were observed as (111) twining interfaces for the multilayers due to the reduction of the stacking fault energy by the co-doping of Mo-W, whereas the nucleation and growth of the nano-twins were limited, without observations for the Mo-W co-doped Ni/Ni3Al multilayer with h = 10 nm. The hardness of the multilayers was enhanced, and the elastic modulus was reduced at a lower h, owing to the grain refinements and layer interface barriers for strengthening, and the existence of the amorphous phase with the inferior modulus, respectively. The resistance against the fracture was enhanced due to toughening by the lamellar structure for the Mo-W doped Ni/Ni3Al multilayer at h ≤ 40 nm. Comprehensively, the Mo-W-doped Ni/Ni3Al multilayer with 10 nm displays a superior mechanical performance.

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Section: Introductionmentioning

confidence: 97%

Individual Layer Thickness Dependence of Microstructure and Mechanical Properties of Magnetron Sputtering Mo-W-Doped Ni/Ni3Al Multilayers

Zhang

Shao²,

Dai

et al. 2022

Coatings

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“…Since intense exposure to high-energy particles can result in metal mixing and interface destruction, the layer’s miscibility mainly determines the morphological stability of the system. Thus, incoherent or semi-coherent systems with low layer miscibility will be the most promising [ 5 , 6 , 7 , 8 , 9 , 10 , 11 , 12 , 13 , 14 ]. One of the most suitable systems is a system based on zirconium and niobium, since these materials are widely used in the nuclear industry due to good mechanical and corrosion properties, as well as low thermal neutron capture cross-section [ 15 ].…”

Section: Introductionmentioning

confidence: 99%

Features of Helium–Vacancy Complex Formation at the Zr/Nb Interface

Svyatkin

Laptev

2023

Materials

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A first-principles study of the atomic structure and electron density distribution at the Zr/Nb interface under the influence of helium impurities and helium–vacancy complexes was performed using the optimised Vanderbilt pseudopotential method. For the determination of the preferred positions of the helium atom, the vacancy and the helium–vacancy complex at the interface, the formation energy of the Zr-Nb-He system has been calculated. The preferred positions of the helium atoms are in the first two atomic layers of Zr at the interface, where helium–vacancy complexes form. This leads to a noticeable increase in the size of the reduced electron density areas induced by vacancies in the first Zr layers at the interface. The formation of the helium–vacancy complex reduces the size of the reduced electron density areas in the third Zr and Nb layers as well as in the Zr and Nb bulk. Vacancies in the first niobium layer near the interface attract the nearest zirconium atoms and partially replenish the electron density. This may indicate a possible self-healing of this type of defect.

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“…With regard to the influence of interfaces on structural and thermal stability, a number of recent studies have highlighted the advantages and challenges associated with copper-based NMLs. For example, Xue et al 14 investigate the role of period thickness on the thermal stability of Cu/W NMLs, demonstrating a reduction in mechanical integrity amongst the thinnest periods. Correspondingly, Dong et al 15 , have reported a significant reduction in the thermal conductivity of Cu/W multilayers scaling with period thickness, which is a) Claudia Cancellieri and Ethan A. Scott contributed equally to this work b) Electronic mail: phopkins@virginia.edu largely attributed to a reduction of interface coherence.…”

Section: Introductionmentioning

confidence: 99%

Interface and layer periodicity effects on the thermal conductivity of copper-based nanomultilayers with tungsten, tantalum, and tantalum nitride diffusion barriers

Cancellieri

Scott

Braun

et al. 2020

Journal of Applied Physics

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Nanomultilayers are complex architectures of materials stacked in sequence with layer thicknesses in the nanometer range. Their application in microelectronics is challenged by their thermal stability, conductivity and interface reactivity which can compromise their performance and usability. By using different materials as thermal barriers and by changing their thickness, it is possible to manipulate interfacial effects on thermal transport. In this work, we report on the thermal conductivity of Cu/W, Cu/Ta, and Cu/TaN sputter deposited nanomultilayers with different thicknesses. The resistive interfacial effects are rationalized and discussed also in relation to the structural transformation into a nano-composite upon high temperature annealing.

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Effects of periods on the evolution of microstructure and mechanical properties of multilayered Cu-W films during thermal annealing

Cited by 5 publications

References 45 publications

Individual Layer Thickness Dependence of Microstructure and Mechanical Properties of Magnetron Sputtering Mo-W-Doped Ni/Ni3Al Multilayers

Individual Layer Thickness Dependence of Microstructure and Mechanical Properties of Magnetron Sputtering Mo-W-Doped Ni/Ni3Al Multilayers

Features of Helium–Vacancy Complex Formation at the Zr/Nb Interface

Interface and layer periodicity effects on the thermal conductivity of copper-based nanomultilayers with tungsten, tantalum, and tantalum nitride diffusion barriers

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