Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls

Cho, Hyung Jun; Kondo, Hiroki; Ishikawa, Kenji; Sekine, Makoto; Hiramatsu, Mineo; Hori, Masaru

doi:10.7567/jjap.53.040307

Cited by 16 publications

(12 citation statements)

References 39 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The nitrogen plasma post-treatment can significantly enhance the electrical and electronic properties of the CNWs. Cho et al modified the conductivity and carrier mobility of CNWs by nitrogen doping while keeping the morphology and edges of CNWs intact [ 130 ]. Compared to in-situ N 2 plasma during the growth of CNWs, N 2 post-treatment on CNWs shows an improved carrier concentration and carrier mobility.…”

Section: Plasma Assisted Surface Modification and Dopingmentioning

confidence: 99%

See 1 more Smart Citation

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

et al. 2018

Self Cite

View full text Add to dashboard Cite

Carbon, one of the most abundant materials, is very attractive for many applications because it exists in a variety of forms based on dimensions, such as zero-dimensional (0D), one-dimensional (1D), two-dimensional (2D), and-three dimensional (3D). Carbon nanowall (CNW) is a vertically-oriented 2D form of a graphene-like structure with open boundaries, sharp edges, nonstacking morphology, large interlayer spacing, and a huge surface area. Plasma-enhanced chemical vapor deposition (PECVD) is widely used for the large-scale synthesis and functionalization of carbon nanowalls (CNWs) with different types of plasma activation. Plasma-enhanced techniques open up possibilities to improve the structure and morphology of CNWs by controlling the plasma discharge parameters. Plasma-assisted surface treatment on CNWs improves their stability against structural degradation and surface chemistry with enhanced electrical and chemical properties. These advantages broaden the applications of CNWs in electrochemical energy storage devices, catalysis, and electronic devices and sensing devices to extremely thin black body coatings. However, the controlled growth of CNWs for specific applications remains a challenge. In these aspects, this review discusses the growth of CNWs using different plasma activation, the influence of various plasma-discharge parameters, and plasma-assisted surface treatment techniques for tailoring the properties of CNWs. The challenges and possibilities of CNW-related research are also discussed.

show abstract

Section: Plasma Assisted Surface Modification and Dopingmentioning

confidence: 99%

“… Temperature dependences of ( a ) electrical conductivities, ( b ) Hall coefficients, ( c ) carrier densities, and ( d ) carrier mobilities of the CNWs before and after post-growth N 2 gas plasma treatments. Reproduced with permission from [ 130 ]. Copyright The Japan Society of Applied Physics 2014.…”

Section: Figurementioning

confidence: 99%

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

et al. 2018

Self Cite

View full text Add to dashboard Cite

show abstract

“…This is mainly due to the creation of the excited nitrogen species (either nitrogen-containing molecules, or atoms), reactive N-atoms or even ions and the defect generation on the graphene surface during plasma processing. These reactive species can influence the structure of CNWs through the crystallinity of the structure and nitrogen configurations or concentrations by controlling the plasma conditions and exposure time [26,[31][32][33]. Based Fig.…”

Section: Introductionmentioning

confidence: 99%

N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence

et al. 2020

Self Cite

View full text Add to dashboard Cite

HIGHLIGHTS • Nitrogen was successfully incorporated in graphene nanowalls (CNWs) using cold gaseous plasma post-treatment and influence of nitrogen concentration and configuration in CNWs on electrical conductivity was demonstrated. • The mechanism of nitrogen incorporation was systematically studied using different characterisation techniques to make a bridge between established DFT theories.

show abstract

“…Cho et al [ 12 ] investigated the electrical conductivity of CNWs after post-plasma treatment in N 2 plasma sustained with a capacitively coupled radio-frequency discharge (CCP). Treatment time was varied between 30 and 300 s. They found increased electrical conductivity after 30 s of treatment.…”

Section: Plasma-assisted Synthesis Of N-doped Graphenementioning

confidence: 99%

“…For obtaining the enhanced electrical properties, graphitic nitrogen is essential [ 9 , 10 ]; however, other nitrogen configurations are also always present, and their concentration may significantly alter the physical and chemical properties of N-doped graphene. Therefore, the optimal procedure for obtaining N-doped graphene should enable the formation of more graphitic and less pyridinic and pyrrolic nitrogen, which may even reduce the conductivity [ 11 , 12 ]. For graphitic nitrogen configuration, n-type doping effect was reported, whereas pyridinic and pyrrolic nitrogen lead to p-type doping effect [ 13 ].…”

Section: Introductionmentioning

confidence: 99%

A Review of Strategies for the Synthesis of N-Doped Graphene-Like Materials

et al. 2020

View full text Add to dashboard Cite

Methods for synthesizing nitrogen-doped graphene-like materials have attracted significant attention among the scientific community because of the possible applications of such materials in electrochemical devices such as fuel cells, supercapacitors and batteries, as well as nanoelectronics and sensors. The aim of this paper is to review recent advances in this scientific niche. The most common synthesis technique is nitridization of as-deposited graphene or graphene-containing carbon mesh using a non-equilibrium gaseous plasma containing nitrogen or ammonia. A variety of chemical bonds have been observed, however, it is still a challenge how to ensure preferential formation of graphitic nitrogen, which is supposed to be the most favorable. The nitrogen concentration depends on the processing conditions and is typically few at.%; however, values below 1 and up to 20 at.% have been reported. Often, huge amounts of oxygen are found as well, however, its synergistic influence on N-doped graphene is not reported. The typical plasma treatment time is several minutes. The results reported by different authors are discussed, and future needs in this scientific field are summarized. Some aspects of the characterization of graphene samples with X-ray photoelectron spectroscopy and Raman spectroscopy are presented as well.

show abstract

Effects of nitrogen plasma post-treatment on electrical conduction of carbon nanowalls

Cited by 16 publications

References 39 publications

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence

A Review of Strategies for the Synthesis of N-Doped Graphene-Like Materials

Contact Info

Product

Resources

About