Effects of negative low self-bias on hydrogenated amorphous carbon films deposited by PECVD technique

Maître, Nicolas; Girardeau, T.; Camelio, S.; Barranco, Ángel; Vouagner, D.; Bréelle, É.

doi:10.1016/s0925-9635(02)00280-7

Cited by 35 publications

(18 citation statements)

References 21 publications

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“…Stress level decrease about 5 times with the energy increase from 100 eV to 800 eV was reported in [16]. Similar approach was observed for the bias assisted plasma CVD deposited DLC films [19]. In comparison with the present study, diamond-like films deposited at lower energies were much more stressed [17,18,36], while the absolute value of the stress of polymer-like carbon film was close to our study (0.1 GPa [6] and 0.7 GPa [36] versus 0.4 GPa, respectively).…”

Section: Mechanical Properties Of the Ion Beam Deposited Carbon Filmssupporting

confidence: 83%

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Deposition of carbon films by direct ion beam

Meškinis¹,

Tamulevičius²,

Kopustinskas³

2004

Lith. J. Phys.

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In this study diamond-like carbon (DLC) films have been grown onto the Si(111) and steel substrates by direct hydrocarbon (hexane, acetylene) ion beam deposition. Raman spectra of the room temperature deposited carbon films were typical of the hard tetrahedral amorphous carbon films. At 500 and 750 K temperatures, polymer-like carbon films have been synthesized. Hydrocarbon gas dilution by nitrogen resulted in growth of the more graphitic films. Increase of the deposition temperature resulted in increased internal stress in carbon films deposited from hexane-hydrogen gas mixture. Thin film stress decreased as a result of the hexane-hydrogen mixture dilution by nitrogen. Stress decreased with increase of the nitrogen concentration. It has been revealed that DLC films can be deposited by direct ion beam onto the AISI 316 steel at room temperature. Ion beam nitridation was the best method for increase of adhesion between the DLC and steel substrate.

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Section: Mechanical Properties Of the Ion Beam Deposited Carbon Filmssupporting

confidence: 83%

“…On the other hand, these films typically possess high average stress after growth. Therefore, the problem of intrinsic stress has received much attention [16][17][18][19][20][21][22][23].…”

Section: Introductionmentioning

confidence: 99%

Deposition of carbon films by direct ion beam

Meškinis¹,

Tamulevičius²,

Kopustinskas³

2004

Lith. J. Phys.

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“…This is consistent with the growth of a polymer-like film, which has been reported to grow on exposure to methane plasma. [27,28] PC2, the loadings of which are shown in Fig. 5(b), discriminates between hydrogen-plasma-modified HOPG and other two cases.…”

Section: Pca Of Tof-sims Measurementsmentioning

confidence: 98%

ToF‐SIMS characterisation of methane‐ and hydrogen‐plasma‐modified graphite using principal component analysis

Deslandes

Jasieniak

Ionescu

et al. 2009

Surface & Interface Analysis

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Time of flight secondary ion mass spectrometry (ToF-SIMS) has been used to determine the extent of surface modification of highly ordered pyrolytic graphite (HOPG) samples that were exposed to radio-frequency methane and hydrogen plasmas. The ToF-SIMS measurements were examined with the multivariate method of principal component analysis (PCA), to maximise the amount of spectral information retained in the analysis. This revealed that the plasma (methane or hydrogen plasma) modified HOPG exhibited greater hydrogen content than the pristine HOPG. The hydrogen content trends observed from the ToF-SIMS studies were also observed in elastic recoil detection analysis measurements. The application of the ToF-SIMS PCA method also showed that small hydrocarbon fragments were sputtered from the hydrogen-plasma-treated sample, characteristic of the formation of a plasma-damaged surface, whereas the methane-plasma-treated surface sputtered larger hydrocarbon fragments, which implies the growth of a polymer-like coating. Scanning tunnelling microscopy measurements of the modified surfaces showed surface features that are attributable to either etching or film growth after exposure to the hydrogen or methane plasma.

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“…Methane plasmas are often used to produce hydrogenated carbon films [8][9][10], or in the deposition of diamond at low pressures [11]. However, in this work the aim is to use the methane plasma treatment to produce a hydrogenated surface, in particular without the extensive etching and disruption to the surface structure that occurs when sp 2 carbon is exposed to hydrogen plasma.…”

Section: Introductionmentioning

confidence: 99%