Effects of LP-MOCVD prepared TiO2 thin films on the in vitro behavior of gingival fibroblasts

Abstract

We report on the in vitro response of human gingival fibroblasts (HGF-1 cell line) to various thin films of titanium dioxide (TiO 2) deposited on titanium (Ti) substrates by low pressure metal-organic chemical vapor deposition (LP-MOCVD). The aim was to study the influence of film structural parameters on the cell behavior comparatively with a native-oxide covered titanium specimen, this objective being topical and interesting for materials applications in implantology. HGF-1 cells were cultured on three LP-MOCVD prepared thin films of TiO 2 differentiated by their thickness, roughness, transversal morphology, allotropic composition and wettability, and on a native-oxide covered Ti substrate. Besides traditional tests of cell viability and morphology, the biocompatibility of these materials was evaluated by fibronectin immunostaining, assessment of cell proliferation status and the zymographic evaluation of gelatinolytic activities specific to matrix metalloproteinases secreted by cells grown in contact with studied specimens. The analyzed surfaces proved to influence fibronectin fibril assembly, cell proliferation and capacity to degrade extracellular matrix without considerably affecting cell viability and morphology. The MOCVD of TiO 2 proved effective in positively modifying titanium surface for medical applications. Surface properties playing a crucial role for cell behavior were the wettability and, secondarily, the roughness, HGF-1 cells preferring a moderately rough and wettable TiO 2 coating.

Surface Treatments and Functional Coatings for Biocompatibility Improvement and Bacterial Adhesion Reduction in Dental Implantology

“…Moreover, its structure is usually amorphous, while some of the most important biological effects, such as antibacterial properties, have been observed especially on crystalline TiO 2 [20]. The deposition of TiO 2 thin-films on dental implants is a way to improve the surface biological properties by controlling the structure, morphology and thickness of the TiO 2 layer exposed to the peri-implant tissues [41][42][43][44][45]. The deposition of TiO 2 coatings with the incorporation of Ag nanoparticles has also been tested [45], in order to imbue dental implants with antibacterial properties.…”

“…The deposition of TiO 2 coatings with the incorporation of Ag nanoparticles has also been tested [45], in order to imbue dental implants with antibacterial properties. Several techniques, including magnetron sputtering [41,45], low pressure chemical vapor deposition (LPCVD) [42], metal-organic chemical vapor deposition (MOCVD) [43] and plasma spray [44] were used to achieve the deposition of the titanium oxide for improving osseointegration [42,44] or prevent bacterial adhesion [41,45]. Other oxides, such as ZrO 2 [41], SiO x [46][47][48][49] and ZnO [50], have also been tested as alternatives to TiO 2 to improve the properties of dental implants, reduce the bacterial adhesion [41,46,49,50], improve the biocompatibility [47] or protect from the corrosion exerted by the body fluids [48].…”

Corrosion and biocompatibility of PPy/PEG coating electrodeposited on Ti6Al7Nb alloy

“…The morphology of the osteoblasts grown on the analysed surfaces was assessed by fluorescence microscopy after actin staining with tetramethylrhodamine iso‐thiocyanate (TRITC)‐phalloidin at 48 h post‐seeding. The samples were processed as previously described 32. Images from representative fields of each sample were acquired via an inverted fluorescent microscope Olympus IX71.…”

Deposition of Photo-Catalytic Tio₂ Film by Low Power Atmospheric Suspension Plasma Spray Using Ar/N₂Working Gas

“…Various deposition techniques can deposit thin titanium oxide films for photo-catalytic applications (anatase-TiO2, etc.). For example, sputtering [2], metalorganic chemical vapor deposition (MOCVD) [3], spray pyrolysis [4], the sol-gel process [5], thermal spray [6], and various other methods. However, there are several engineering problems associated with these deposition processes, such as the necessity of vacuum equipment, low deposition rates, deposition time, the requirement of special and costly equipment, as well as feedstock powder [7].…”