2017
DOI: 10.1109/tns.2017.2709815
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Effects of Interface Donor Trap States on Isolation Properties of Detectors Operating at High Luminosity LHC (HL-LHC)

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Cited by 22 publications
(38 citation statements)
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“…Devices under study include: (a) MOS capacitors, gate-controlled diodes (GDs) and MOSFETs fabricated at Fondazione Bruno Kessler (FBK, Italy) on 6" n-type and p-type SiSi Direct Wafer Bonded Wafers from ICEMOS Technology Ltd, Float Zone <100> oriented wafer, with a nominal resistivity higher than 3 kΩ•cm; (b) MOS capacitors and gated-diodes fabricated at Hamamatsu Photonics (HPK) on 6" high-resistivity p-type Float Zone, <100> oriented wafer, with p-stop or with p-spray layer implanted at the surface to isolate adjacent n + electrodes; (c) two different processes of Infineon Technology (IFX): (i) IFX devices on high-resistivity p-type Float Zone (FZ)⟨100⟩ 8'' wafers (ii) IFX devices on high-resistivity p-type Float Zone(FZ)⟨100⟩ 6'' wafers with different processes and thermal budget. Further details about the test structures description and the experimental procedure and measurement setup are detailed explained in previous related works [11][12][13].…”
Section: Methodsmentioning
confidence: 99%
“…Devices under study include: (a) MOS capacitors, gate-controlled diodes (GDs) and MOSFETs fabricated at Fondazione Bruno Kessler (FBK, Italy) on 6" n-type and p-type SiSi Direct Wafer Bonded Wafers from ICEMOS Technology Ltd, Float Zone <100> oriented wafer, with a nominal resistivity higher than 3 kΩ•cm; (b) MOS capacitors and gated-diodes fabricated at Hamamatsu Photonics (HPK) on 6" high-resistivity p-type Float Zone, <100> oriented wafer, with p-stop or with p-spray layer implanted at the surface to isolate adjacent n + electrodes; (c) two different processes of Infineon Technology (IFX): (i) IFX devices on high-resistivity p-type Float Zone (FZ)⟨100⟩ 8'' wafers (ii) IFX devices on high-resistivity p-type Float Zone(FZ)⟨100⟩ 6'' wafers with different processes and thermal budget. Further details about the test structures description and the experimental procedure and measurement setup are detailed explained in previous related works [11][12][13].…”
Section: Methodsmentioning
confidence: 99%
“…The model is taken from Ref. [8] and contains two acceptor and one donor type traps. This model was chosen as one amongst several available models as it is being widely used in the community.…”
Section: Simulation Methods and Setupmentioning
confidence: 99%
“…Unless otherwise specified, the sensors are modeled without radiation damage. The effects of radiation damage are approximated by reducing the collected charge according to the n + -in-n planar sensor results based on combining TCAD simulations from the Perugia [31] and New Delhi models [32] with drift, diffusion, and digitization presented in Ref. [10].…”
Section: Simulationmentioning
confidence: 99%