Effects of high salinity and constituent organic compounds on treatment of photo-processing waste by a sulfur-oxidizing bacteria/granular activated carbon sludge system

Removal of FePO4 and Fe3(PO4)2 crystals on the surface of passive fillers in Fe0/GAC reactor using the acclimated bacteria

“…Therefore, the removal method of FeS and S will be studied seriously in the next work. In literature, it is clear that low valence sulfur (i.e., S 2− , S and SO 3 2− ) can be oxidized to SO 4 2− by the sulfur-oxidizing bacteria [33,34]. Therefore, the low valence sulfur in FeS and S can be oxidized to SO 4 2− by the sulfuroxidizing bacteria.…”

The evaluation of the organic load of the waste offset developer with extraction methods

“…Via the treatment by the Fenton's advanced oxidation process, almost all organic substances are removed (Vengris et al, 2007). In the paper by Lin et al (2002), it is stated that the average waste offset developer consists of: p-phenylenediamine, hydroquinone, phenidone, benzyl alcohol, diethylene glycol, triethylene glycol, hydroxylamine, triethanolamine, formalin (consisting of 40% formaldehyde, 8% methanol and 52% water), dialdehyde glutamic acid, organic heterocyclic compounds, p-toluene sulfonate, 5-sulfosalicylic acid, acetic acid, surfactants, then inorganic compounds (sodium sulfite, potassium sulfite, potassium carbonate, sodium hydrogen carbonate, boric acid, potassium hydroxide, sodium hydroxide, ammonium bromide and potassium bromide). The waste offset developer as a byproduct of the developing of the offset printing plate is most commonly toxic by its characteristics and potentially harmful to the environment.…”