2007
DOI: 10.1016/j.mseb.2007.06.004
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Effects of barrier layers on the electrical properties of (Pb,La)(Zr,Ti)O3 films on nickel foils

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Cited by 7 publications
(3 citation statements)
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References 10 publications
(17 reference statements)
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“…In spite of the lack of increase in overall capacitance density, the addition of a ZrO 2 buffer layer did allow for decreased leakage currents and improved reliability, 26 which are certainly important for a manufacturable process. An alternative to insulating buffer layers is the inclusion of conducting oxide layers such as LaNiO 3 , 27,31–33 (La,Sr)MnO 3 , 28 or RuO x 31 . Use of solution‐deposited LaNiO 3 layers on stainless steel, titanium, and nickel substrates resulted in a doubling of the permittivity to >400 and a decrease in loss tangent, both of which could be attributed to a reduction in interdiffusion between PZT films and substrates as well as a reduction in substrate interfacial oxidation 27 .…”
Section: Film‐on‐foilmentioning
confidence: 99%
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“…In spite of the lack of increase in overall capacitance density, the addition of a ZrO 2 buffer layer did allow for decreased leakage currents and improved reliability, 26 which are certainly important for a manufacturable process. An alternative to insulating buffer layers is the inclusion of conducting oxide layers such as LaNiO 3 , 27,31–33 (La,Sr)MnO 3 , 28 or RuO x 31 . Use of solution‐deposited LaNiO 3 layers on stainless steel, titanium, and nickel substrates resulted in a doubling of the permittivity to >400 and a decrease in loss tangent, both of which could be attributed to a reduction in interdiffusion between PZT films and substrates as well as a reduction in substrate interfacial oxidation 27 .…”
Section: Film‐on‐foilmentioning
confidence: 99%
“…Use of solution‐deposited LaNiO 3 layers on stainless steel, titanium, and nickel substrates resulted in a doubling of the permittivity to >400 and a decrease in loss tangent, both of which could be attributed to a reduction in interdiffusion between PZT films and substrates as well as a reduction in substrate interfacial oxidation 27 . In a direct comparison of PLZT films deposited on nickel substrates with and without a conductive barrier layer, Kim 31 credited a substantial increase in permittivity with peak values at room temperature exceeding 1000 when using Ru/RuO x oxide buffer layers to reduced interdiffusion between substrate and film and minimal nickel substrate oxidation. (La,Sr)MnO 3 buffer layers on titanium foil substrates revealed a similar effect to LaNiO 3 buffers on nickel substrates 28 .…”
Section: Film‐on‐foilmentioning
confidence: 99%
“…29,30 Commercially available nickel foil has been widely used as a substrate for the growth of nanomaterials, such as nanowires, 62 Co 3 O 4 nanorods, 63 carbon nanofibers, 64 and (Pb 0.92 La 0.08 )-(Zr 0.52 Ti 0.48 )O 3 (PLZT) films. 65 More importantly, when used as a substrate material for electrode systems, the mechanical features of the thin foil can improve engineering availability. The nickel foil used in the current work has a thickness of 0.125 mm (99.9+%), and its shape can be easily manipulated.…”
Section: ■ Results and Discussionmentioning
confidence: 99%