2017
DOI: 10.1016/j.spmi.2017.05.003
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Effects of annealing temperature on the electrical characteristics of Li–N co-doped polycrystalline ZnO thin film transistors

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Cited by 7 publications
(1 citation statement)
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“…Over the past decade, ZnO-based thin film transistors (TFTs) have gained extensive attention for the fabrication of electronic devices, either emerging as a amorphous or a crystalline structure [1][2][3][4]. The corresponding TFTs exhibited relatively satisfactory electrical characteristics and high optical transparency, however, those electrical characteristics, including saturation mobility (μ SAT ), threshold voltage (V TH ) and on/ off current ratio (I ON /I OFF ), are strongly affected by the existence of native defects [5][6][7][8], especially the oxygen vacancy (Vo) in the channel layer.…”
Section: Introductionmentioning
confidence: 99%
“…Over the past decade, ZnO-based thin film transistors (TFTs) have gained extensive attention for the fabrication of electronic devices, either emerging as a amorphous or a crystalline structure [1][2][3][4]. The corresponding TFTs exhibited relatively satisfactory electrical characteristics and high optical transparency, however, those electrical characteristics, including saturation mobility (μ SAT ), threshold voltage (V TH ) and on/ off current ratio (I ON /I OFF ), are strongly affected by the existence of native defects [5][6][7][8], especially the oxygen vacancy (Vo) in the channel layer.…”
Section: Introductionmentioning
confidence: 99%