2004
DOI: 10.1016/j.apsusc.2003.09.011
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Effect of the growth sequence on the properties of InGaP/GaAs/InGaP quantum wells grown by LP-MOVPE from group-V metalorganic sources

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Cited by 18 publications
(21 citation statements)
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“…In order to optimize the interfaces, previously found conditions were applied [14]. Trimethylgallium (TMGa), trimethylindium, TBAs and TBP metalorganic precursors were used for III-V-group elements, while hydrogen-diluted disilane was used for n-doping and dimethylzinc for p-doping.…”
Section: Experimentalsmentioning
confidence: 99%
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“…In order to optimize the interfaces, previously found conditions were applied [14]. Trimethylgallium (TMGa), trimethylindium, TBAs and TBP metalorganic precursors were used for III-V-group elements, while hydrogen-diluted disilane was used for n-doping and dimethylzinc for p-doping.…”
Section: Experimentalsmentioning
confidence: 99%
“…Indeed, (InGaAsP)-based devices, grown by using TBAs and TBP and showing at least comparable otherwise better performances, have been recently realized [10][11][12][13]. By employing a MOVPE reactor using TBAs and TBP precursors, we recently investigated the effects of different gas-switching sequences for the growth of multi-quantum wells (MQWs) based on the lattice-matched system InGaP/GaAs [14]. It resulted that the insertion of a few-monolayer thick GaAsP IL at the direct GaAs-on-InGaP interface and the use of proper growth interruption purges lead to optimum optical properties of the structures, by suppressing the undesired anomalous low-energy emission due to In memory effect.…”
Section: Introductionmentioning
confidence: 99%
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“…Este procedimento envolve a estabilização da superfície de GaAs durante 10 segundos com fluxo de As, e, posteriormente, uma exposição desta superfície ao fluxo de P durante 45 segundos. Desse modo, as variações se resumem nos procedimentos adotados para a primeira interface, a qual, seguindo relatos de diversos trabalhos (BEGOTTI et al, 2004), é a interface mais susceptível aos efeitos de difusão composicional no sistema GaInP/GaAs. Na amostra II-A, após a estabilização com fluxo de P por 15 segundos, a superfície do GaInP ficou exposta ao As durante 30 segundos.…”
Section: Figura 8 Espectros De Pl Das Amostras I-a (A) I-b (B) E I-unclassified
“…A systematic study is therefore necessary to reduce this complexity and to provide insight for process improvement. For this purpose, a large number of InGaP/GaAs interfaces have been extensively researched [9][10][11][12][13]. Basically, to control the effective band-gap energy, fabrication of quantum well structures with an abrupt hetero-interface is crucial for controlling the quantum effects.…”
Section: Introductionmentioning
confidence: 99%