2022
DOI: 10.1016/j.tsf.2022.139569
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Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering

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Cited by 5 publications
(6 citation statements)
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“…The present study of co-sputtering was conducted on the same sputter coater used to grow Nb3Sn films from a single stoichiometric target by growth of Nb/Sn multilayers followed by their interdifusion and reaction at high temperatures to form Nb3Sn [6][7][8][9][10]. The best Nb3Sn films produced from a a stoichiometric target, multilayers, and co-sputtering had Tc = 17.83, 17.84, and 17.61 K, ΔTc = 0.03, 0.03, and 0.19 K, and RRR = 5.41, 4.40, and 3.63, respectively.…”
Section: Discussionmentioning
confidence: 99%
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“…The present study of co-sputtering was conducted on the same sputter coater used to grow Nb3Sn films from a single stoichiometric target by growth of Nb/Sn multilayers followed by their interdifusion and reaction at high temperatures to form Nb3Sn [6][7][8][9][10]. The best Nb3Sn films produced from a a stoichiometric target, multilayers, and co-sputtering had Tc = 17.83, 17.84, and 17.61 K, ΔTc = 0.03, 0.03, and 0.19 K, and RRR = 5.41, 4.40, and 3.63, respectively.…”
Section: Discussionmentioning
confidence: 99%
“…The sputter coater and furnace used in the present study are the same that were used in previous studies of growth of Nb3Sn on Nb and sapphire with a stoichiometric target and multilayer deposition of Nb and Sn [7][8][9][10]. For the different Nb3Sn sputter deposition methods (stoichiometric target, multilayers, and co-sputtering), the base vacuum conditions were similar and the purity of the target materials and Ar sputter gas were also similar.…”
Section: Methodsmentioning
confidence: 99%
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“…By multilayer sequential sparking on niobium at substrate temperatures ranging from room temperature to 250 °C, Md Nizam Sayeed et al actually described the fabrication of niobium tin (Nb 3 Sn) films. 102 They examined the resistivity of the superconducting films from room temperature to below the superconducting critical temperature T c . The multilayers were deposited at room temperature, yielding a film T c of 17.76 K. The films T c of 17.58 K are produced when the deposition temperature is increased to 250 °C, and voids were significantly reduced.…”
Section: Fabrication Feasibility and Experimental Tolerancementioning
confidence: 99%