Effect of slit aspect ratio on free jet properties

Raju, Channa; Kurian, Job

doi:10.1016/0042-207x(94)00085-9

Cited by 4 publications

(2 citation statements)

References 2 publications

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“…On the contrary, since pressure rises in correspondence of shock waves, the deposition of clusters with higher sizes and lower kinetic energies can be performed outside of the silence zone. As for the Mach disk, this is located at a distance X MO for a circular orifice with diameter D and at X MS for a slit with aspect ratio w/h >1, where w and h are the slit width and height respectively [27], while its lateral extension D MO can be estimated according to [28]:…”

Section: The Experimental Setupmentioning

confidence: 99%

A Supersonic Plasma Jet Source for Controlled and Efficient Thin Film Deposition

Biganzoli¹,

Fumagalli²,

Fonzo³

et al. 2012

JMP

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A novel plasma source suitable for controllable nanostructured thin film deposition processes is proposed. It exploits the separation of the process in two distinct phases. First precursor dissociation and radical formation is performed in a dense oxidizing plasma. Then nucleation and aggregation of molecular clusters occur during the expansion into vacuum of a supersonic jet. This allows a superior control of cluster size and energy in the process of film growth. Characterization of the plasma state and source performances in precursor dissociation have been investigated. The performances of this new Plasma Assisted Supersonic Jet Deposition technique were demonstrated using organic compounds of titanium to obtain TiO<sub>2</sub> thin nanostructured films

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Section: The Experimental Setupmentioning

confidence: 99%

A Supersonic Plasma Jet Source for Controlled and Efficient Thin Film Deposition

Biganzoli¹,

Fumagalli²,

Fonzo³

et al. 2012

JMP

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“…The chocked flow condition thermodynamically decouples the two stages of the system and thus P 1 , the main parameter affecting the synthesized film porosity, can be ideally varied without effecting P 0 which in turn influences the features of the individual nanoparticles nucleating in the plasma discharge [40]. R cr , is a fundamental parameter of the NanoJeD synthesis process since, below this specific value, the flow field structure of the sonic jet is lost, thus setting an upper boundary to the range of P 1 that can be employed for thin film fabrication [42,43].…”

Section: Nanojed Plasma Synthesis Reactormentioning

confidence: 99%

Large area porous 1D photonic crystals comprising silicon hierarchical nanostructures grown by plasma-assisted, nanoparticle jet deposition

et al. 2018

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In this contribution, we describe a room-temperature, template-free, single-step approach for the growth of functional crystalline silicon nanostructures with tailored porosity and photonic properties. The method employs a plasma-assisted nanoparticle synthesis reactor in combination with a supersonic jet deposition stage, in what we call nanoparticle jet deposition or plasma-assisted, supersonic aerosol jet deposition. The relationship between plasma parameters, nanoparticle impaction conditions and the resulting silicon material structural characteristics is investigated. This understanding is successfully employed for the production of porous 1D photonic crystals obtained by periodically modulating the density of the hierarchical silicon nanostructures and hence their local refractive index. The open porosity of this device is then exploited in a proof of concept optical chemical sensor.

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