2012
DOI: 10.4236/jmp.2012.330200
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A Supersonic Plasma Jet Source for Controlled and Efficient Thin Film Deposition

Abstract: A novel plasma source suitable for controllable nanostructured thin film deposition processes is proposed. It exploits the separation of the process in two distinct phases. First precursor dissociation and radical formation is performed in a dense oxidizing plasma. Then nucleation and aggregation of molecular clusters occur during the expansion into vacuum of a supersonic jet. This allows a superior control of cluster size and energy in the process of film growth. Characterization of the plasma state and sourc… Show more

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Cited by 18 publications
(13 citation statements)
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“…These nanostructures often take form of nanorods, nanowires, and nanotubes, with chemical vapor deposition (CVD) and its more advanced variations, e.g., Plasma Assisted Supersonic Jet Deposition (PA-SJD), frequently used to produce such thin nanostructured films. [38][39][40] • The primary aim of our study is to gain a deeper insight into the interplay of several surface morphology descriptors such as ordering, connectivity, self-affinity and fractality of the plasma treated surfaces to discover how these characteristics influence the ultimate wettability and thus contribute to the development of another powerful tool for the future progress in the fabrication of PET-based and other functional nanomaterial-based devices.…”
Section: Introductionmentioning
confidence: 99%
“…These nanostructures often take form of nanorods, nanowires, and nanotubes, with chemical vapor deposition (CVD) and its more advanced variations, e.g., Plasma Assisted Supersonic Jet Deposition (PA-SJD), frequently used to produce such thin nanostructured films. [38][39][40] • The primary aim of our study is to gain a deeper insight into the interplay of several surface morphology descriptors such as ordering, connectivity, self-affinity and fractality of the plasma treated surfaces to discover how these characteristics influence the ultimate wettability and thus contribute to the development of another powerful tool for the future progress in the fabrication of PET-based and other functional nanomaterial-based devices.…”
Section: Introductionmentioning
confidence: 99%
“…The PA-SJD [ 42 , 43 ] technique consists of a two-step process confined within two stainless steel vacuum chambers of cylindrical shape that are connected via a small nozzle of varying aperture size. The plasma chamber used in this study had a length L p = 95 mm and radius R p = 62.5 mm, and the respective metrics of the deposition chamber were L D = 200 mm and R D = 160 mm (see Figure 1 ).…”
Section: Methodsmentioning
confidence: 99%
“…We employed the quadrupole mass spectrometer (QMS) Hiden EQP-1000 Analyzer (Warrington, UK) in order to detect neutrals, radicals, and ion species [ 42 ]. The QMS could be positioned along the jet center line (the z -axis), so we are able to sample chemical species at different positions, as well as provide in situ real-time sampling.…”
Section: Methodsmentioning
confidence: 99%
“…The growth ofthin and ultra-thin films may be achieved using a large variety oftechniques such as chemical vapour deposition, RF sputtering, pulsedlaser deposition or plasma enhanced chemical vapour deposition [1][2][3]. Recently, a new process, which uses aplasma torch operating at low pressure has been developed with theaim of depositing uniform thin layers on large surfaces [4,5]. In this plasma spraying process plasma jets areused as a heat sources to melt and accelerate the injected nanoparticles which subsequently impinge and solidify on a substrate.…”
Section: Introductionmentioning
confidence: 99%