Abstract:We determine the energy splitting of the conduction-band valleys in two-dimensional electrons confined to low-disorder Si quantum wells. We probe the valley splitting dependence on both perpendicular magnetic field B and Hall density by performing activation energy measurements in the quantum Hall regime over a large range of filling factors. The mobility gap of the valley-split levels increases linearly with B and is strikingly independent of Hall density. The data are consistent with a transport model in whi… Show more
“…In Si-MOS, we observe large valley splitting energies that increase in the range of 3.7 to 8.2 meV nearlinearly with density, regardless of the device location on the wafer, transport properties of the 2DEG, and temperature. Crucially, we see that the valley splitting densitydependence in Si-MOS extends to the high density regime the same trend that was observed in Si/SiGe at low density [17]. This trend is compatible [32] with the predicted density-dependent valley splitting calculated for a disorder-free Si/SiGe quantum well top-interface [23].…”
supporting
confidence: 87%
“…Due to the large magnetic field needed to overcome the Landau level broadening, enhancement of energy gaps is observed [16], making a direct comparison to the single-particle energy levels of QDs challenging. Furthermore, the complex electrostatics of quantum Hall edge states must be taken into account to correctly interpret the measurements [17].…”
mentioning
confidence: 99%
“…Magenta diamonds are experimental valley splitting values from Si/SiGe heterostructure-FET from ref. [17] of two parallel channels with similar high mobility contributing to transport. We attribute the origin of these channels to the two low-lying conducting band valleys in Si, since the valley splitting energy should dominate at low fields over cyclotron and Zeeman energy [25,26].…”
mentioning
confidence: 99%
“…We compare our results with the experimental results (magenta diamonds, from ref. [17]) and effective mass calculations (black line, from ref. [23]) for valleys splitting in 2DEGs obtained in Si/SiGe heterostructures.…”
mentioning
confidence: 99%
“…Note that in the Si/SiGe heterostructures in ref. [17]) valley splitting was estimated by activation measurements in the quantum Hall regime. In Si-MOS, we observe large valley splitting energies that increase in the range of 3.7 to 8.2 meV nearlinearly with density, regardless of the device location on the wafer, transport properties of the 2DEG, and temperature.…”
We determine the energy splitting of the conduction-band valleys in two-dimensional (2D) electrons confined in silicon metal oxide semiconductor (Si-MOS) Hall-bar transistors. These Si-MOS Hall bars are made by advanced semiconductor manufacturing on 300 mm Si wafers and support a 2D electron gas of high quality with a maximum mobility of 17.6×10 3 cm 2 /Vs and minimum percolation density of 3.45 × 10 10 cm −2 . Because of the low disorder, we observe beatings in the Shubnikov-de Haas oscillations that arise from the energy-split two low-lying conduction band valleys. From the analysis of the oscillations beating patterns up to T = 1.7 K, we estimate a maximum valley splitting of ∆EV S = 8.2 meV at a density of 6.8 × 10 12 cm −2 . Furthermore, the valley splitting increases with density at a rate consistent with theoretical predictions for a near-ideal semiconductor/oxide interface.
“…In Si-MOS, we observe large valley splitting energies that increase in the range of 3.7 to 8.2 meV nearlinearly with density, regardless of the device location on the wafer, transport properties of the 2DEG, and temperature. Crucially, we see that the valley splitting densitydependence in Si-MOS extends to the high density regime the same trend that was observed in Si/SiGe at low density [17]. This trend is compatible [32] with the predicted density-dependent valley splitting calculated for a disorder-free Si/SiGe quantum well top-interface [23].…”
supporting
confidence: 87%
“…Due to the large magnetic field needed to overcome the Landau level broadening, enhancement of energy gaps is observed [16], making a direct comparison to the single-particle energy levels of QDs challenging. Furthermore, the complex electrostatics of quantum Hall edge states must be taken into account to correctly interpret the measurements [17].…”
mentioning
confidence: 99%
“…Magenta diamonds are experimental valley splitting values from Si/SiGe heterostructure-FET from ref. [17] of two parallel channels with similar high mobility contributing to transport. We attribute the origin of these channels to the two low-lying conducting band valleys in Si, since the valley splitting energy should dominate at low fields over cyclotron and Zeeman energy [25,26].…”
mentioning
confidence: 99%
“…We compare our results with the experimental results (magenta diamonds, from ref. [17]) and effective mass calculations (black line, from ref. [23]) for valleys splitting in 2DEGs obtained in Si/SiGe heterostructures.…”
mentioning
confidence: 99%
“…Note that in the Si/SiGe heterostructures in ref. [17]) valley splitting was estimated by activation measurements in the quantum Hall regime. In Si-MOS, we observe large valley splitting energies that increase in the range of 3.7 to 8.2 meV nearlinearly with density, regardless of the device location on the wafer, transport properties of the 2DEG, and temperature.…”
We determine the energy splitting of the conduction-band valleys in two-dimensional (2D) electrons confined in silicon metal oxide semiconductor (Si-MOS) Hall-bar transistors. These Si-MOS Hall bars are made by advanced semiconductor manufacturing on 300 mm Si wafers and support a 2D electron gas of high quality with a maximum mobility of 17.6×10 3 cm 2 /Vs and minimum percolation density of 3.45 × 10 10 cm −2 . Because of the low disorder, we observe beatings in the Shubnikov-de Haas oscillations that arise from the energy-split two low-lying conduction band valleys. From the analysis of the oscillations beating patterns up to T = 1.7 K, we estimate a maximum valley splitting of ∆EV S = 8.2 meV at a density of 6.8 × 10 12 cm −2 . Furthermore, the valley splitting increases with density at a rate consistent with theoretical predictions for a near-ideal semiconductor/oxide interface.
yields two-dimensional projections and hence does not resolve the third dimension of the interface.Atom probe tomography (APT) with its capability of imaging the local chemistry in three-dimensions at the near atomic scale is a prime candidate for achieving atomic-scale characterization of buried interfaces. [12][13][14][15] However, limitations arising from the comparatively simple algorithms to reconstruct APT data are known to cause significant aberrations near interfaces, limiting accuracy. [12,[16][17][18] One way to address this issue is to improve APT data reconstruction using simulations or calibrations from electron tomography. [19,20] Both approaches are however time consuming and rely on information not readily available from an APT analysis.Here, we propose an alternative approach. Instead of trying to correctly reconstruct the entire volume analyzed in the tomography, we develop a protocol that allows us to choose a set of reconstruction parameters for one interface at a time by combining brute force search with a simple, standard reconstruction algorithm [16] from data exclusively acquired during APT. We present a fully automated process that is highly reproducible and enables us to characterize interface widths and roughness on a sub-nanometer scale.
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