2017
DOI: 10.1007/978-981-10-4280-5_23
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Effect of Line Parasitic Variations on Delay and Energy of Global On-Chip VLSI Interconnects in DSM Technology

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Cited by 3 publications
(2 citation statements)
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“…Hence, increasing the amount of power dissipation in integrated circuits. Improvement in technology or scaling leads to provide a significant increase in parasitic interconnects wires [6][7][8][9][10][11][12]. The inductive effect and capacitive coupling effect give interconnect wire coupling crosstalk significance and cause many signal integrity problems.…”
Section: Introductionmentioning
confidence: 99%
“…Hence, increasing the amount of power dissipation in integrated circuits. Improvement in technology or scaling leads to provide a significant increase in parasitic interconnects wires [6][7][8][9][10][11][12]. The inductive effect and capacitive coupling effect give interconnect wire coupling crosstalk significance and cause many signal integrity problems.…”
Section: Introductionmentioning
confidence: 99%
“…Inductive effect and capacitive coupling effect gives interconnect wire coupling crosstalk significant and cause many signal integrity problems. Hence, interconnect wire down scaling is thus careful to be the real contest to CMOS scaling [12][13][14][15][16][17][18][19].…”
Section: Introductionmentioning
confidence: 99%