2011
DOI: 10.1007/s10948-011-1355-6
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Effect of ex situ Post-annealing Treatments on Sr2FeMoO6 Thin Films

Abstract: Magnetoresistive Sr 2 FeMoO 6 thin films were grown by pulsed laser deposition at optimized deposition atmosphere and temperature. Films were then ex situ postannealed in different atmospheres and by vacuum annealing at temperatures between 500°C and 1100°C. Ar and air annealed samples were destroyed by ex situ post-annealing treatment, due to formation and dominance of SrMoO 4 impurity phase. X-ray diffraction showed no impurities and full texturation of vacuum and ArH 2 (5%) annealed samples. Those samples s… Show more

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Cited by 9 publications
(4 citation statements)
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“…All the values are quite close to each other, but a slight increase in RMS-roughness with increasing thickness is observed. The RMS-roughness values are also quite high compared to the previously obtained values (from 2.7 nm to 9.7 nm [5,24]) and considering the possible multilayer structured applications. The film thickness was determined with AFM over an edge etched with nitric acid.…”
Section: Structural and Magnetic Propertiessupporting
confidence: 47%
“…All the values are quite close to each other, but a slight increase in RMS-roughness with increasing thickness is observed. The RMS-roughness values are also quite high compared to the previously obtained values (from 2.7 nm to 9.7 nm [5,24]) and considering the possible multilayer structured applications. The film thickness was determined with AFM over an edge etched with nitric acid.…”
Section: Structural and Magnetic Propertiessupporting
confidence: 47%
“…However, the tunneling barriers necessary for LFMR could be additionally created, e.g., by a post-deposition heat treatment at 475-500 • C in an ultrapure Ar (99.9995 %) atmosphere for 5 h [56] or by annealing in a reducing 5%H 2 /N 2 atmosphere for 10 h at 950 • C [58]. In comparison, neither magnetic nor magnetotransport nor structural properties were improved by post-deposition annealing of SFMO thin films at temperatures between 500 and 1100 • C in a vacuum, Ar, 5%H 2 /Ar, or air atmospheres for 5 or 10 h [59]. Obviously, grain boundary modification should be performed under carefully selected conditions.…”
Section: Low-field Magnetoresistancementioning
confidence: 95%
“…[142] Depending on deposition conditions, LFMR might be missing in SFMO thin films deposited by PLD onto SrTiO 3 (001) substrates. [32,109] However, the tunneling barriers necessary for LFMR could be additionally created, for instance, by a postdeposition film annealing at 475-500 C in an ultrapure Ar (99.9995%) atmosphere for 5 h [32] or by annealing in a reducing 5% H 2 /N 2 atmosphere for 10 h. [143] Contrarily, neither magnetic nor magnetotransport or structural properties were improved by postdeposition annealing of SFMO thin films between 500 and 1100 C in vacuum, Ar, 5% H 2 /Ar, and air atmospheres for 5 or 10 h. [144] Obviously, grain boundary modification should be performed under carefully selected conditions. LFMR is favored in thin films subjected to large biaxial compressive strain at the film-substrate interface.…”
Section: Low-field Magnetoresistancementioning
confidence: 99%