The hermetic sealing of a Micro Electronic Mechanical (MEMS) system is a critical requirement to the functional operation of MEMS devices. Cu-Sn SolidLiquid Inter-diffusion (SLID) bonding is one such encapsulation method of achieving hermetic sealing of MEMS devices. Recently, studies have identified a cause for concern relating to the reliability of SLID bonding. These studies have shown that electroplated (EP) copper is a source of higher voiding propensity. Labelled Kirkendall Voids (KV), which are micro voids that form at the interface of intermetallic compounds (IMC), due to the imbalance of Cu-Sn atom fluxes. KV have been shown to be a serious reliability issue which many studies have shown to seriously degrade the mechanical stability of interfaces. This paper will examine previous studies undertaken into the causes of KV, test whether KV are reproducible while varying EP parameters, and address the question, whether these are really KV?
IntroductionMuch research has been conducted into the effects of voiding on the mechanical and electrical properties of not only SLID bonding but solder joints and interconnects. The research has concluded that an interface which displays high levels of voiding has severely reduced electrical and mechanical properties. Such negative effects included reduced mechanical properties, and to a more extreme extent, degradation of electrical properties [1,2].Previous studies have shown that the density of voiding in a solder joint is a function of the deposited Cu in a CuSn solder pair. High quality (Pure OFHC) Cu and Electrolyte was used to produce a Cu-Sn interface which was then subsequently thermally aged. Results from this showed that the High quality Cu was void free, and in contrast, the EP deposited Cu exhibited high levels of voiding [3,4].Although detailed studies have drawn attention to the reliability issues caused by voiding, the root-cause of voiding has not been extensively studied. One investigated cause of voiding is the incorporation of residual impurities into the EP copper layer which resulted in being a catalyst for void nucleation and growth. Organic impurities have been detected, from additives used in commercial plating solutions for controlling the EP deposition. Identified additives include, SPS (bis-sodium sulfopropyldisulfide), Cl-ions and PEG (polyethylene glycol) were acknowledged as sources of the deposited organic impurities [3,5,6].