1999
DOI: 10.3379/jmsjmag.23.120
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Effect of Composition near the Layer Boundary on GMR for Co/Cu, Ag Multilayers Electrodeposited by Pulse Method

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Cited by 6 publications
(4 citation statements)
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“…6. The results of Ueda et al 12 show the same features: the non-saturating MR(H) curves obtained for Cu thicknesses around their first observed GMR maximum (d Cu  1.5 nm) are dominated by an SPM term whereas split MR peaks with low saturation fields appear for Cu layer thicknesses around 3 to 4 nm. It should also be noted that their first GMR maximum appears roughly at a Cu layer thickness where usually FM coupling is observed for physically deposited Co/Cu multilayers.…”
Section: Reports With "Oscillatory" Gmr Behavioursupporting
confidence: 64%
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“…6. The results of Ueda et al 12 show the same features: the non-saturating MR(H) curves obtained for Cu thicknesses around their first observed GMR maximum (d Cu  1.5 nm) are dominated by an SPM term whereas split MR peaks with low saturation fields appear for Cu layer thicknesses around 3 to 4 nm. It should also be noted that their first GMR maximum appears roughly at a Cu layer thickness where usually FM coupling is observed for physically deposited Co/Cu multilayers.…”
Section: Reports With "Oscillatory" Gmr Behavioursupporting
confidence: 64%
“…From among the papers reporting on an "oscillation" of the GMR magnitude for electrodeposited Co/Cu multilayers, [11][12][13][14][15] we discuss first the results by Jyoko et al 13 For a multilayer with d Cu around 1 nm, these authors present an MR(H) curve which unambiguously reveals a dominant SPM contribution. Therefore, the high GMR value at this Cu layer thickness cannot originate from an AF coupled state and this conclusion is further supported by the M(H) curve reported for the same sample since it shows a large remanence whereas an AF-coupled state should exhibit a low remanence.…”
Section: Reports With "Oscillatory" Gmr Behaviourmentioning
confidence: 99%
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