2010
DOI: 10.1016/j.pmatsci.2009.07.001
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Electrodeposited multilayer films with giant magnetoresistance (GMR): Progress and problems

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Cited by 213 publications
(206 citation statements)
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“…16 in Ref. 4) that the Cu content of the magnetic layer is about 2.8 at.% when producing the Co/Cu multilayers with the G/P pulse sequence.…”
Section: Methodsmentioning
confidence: 95%
See 1 more Smart Citation
“…16 in Ref. 4) that the Cu content of the magnetic layer is about 2.8 at.% when producing the Co/Cu multilayers with the G/P pulse sequence.…”
Section: Methodsmentioning
confidence: 95%
“…4 A variety of baths have been used for the preparation of ED Co/Cu multilayers, 4 the simplest one containing merely CoSO 4 and CuSO 4 . Over the last two decades, numerous reports have been published on studying the GMR characteristics of ED Co/Cu multilayers from the pure sulfate bath (containing at most some buffering agents).…”
mentioning
confidence: 99%
“…1 Sputtered Co/Cu multilayers [2][3][4] exhibit an oscillatory GMR and a room-temperature GMR of about 50% and 20% at about 1 and 2 nm Cu layer thicknesses, respectively. At these particular spacer thicknesses, a strong antiferromagnetic (AF) exchange coupling exists between the adjacent magnetic layers.…”
mentioning
confidence: 99%
“…As demonstrated by Bao and Kavanagh [63] and several others [64,65], FM metals and FM-NM multilayers have also been produced in the form of nanowires and nanopillars using electro-chemical methods-including galvanostatic electrodeposition and Pulsed-current electro-deposition method [66,67]. Pulsed-current electrochemical deposition techniques, can be used to deposit FM-NM multilayers in a highly confined spaces and the technique allows use of substrates if more complex geometries that are not possible via high vacuum evaporation methods.…”
Section: Giant Magnetoresistance Effectmentioning
confidence: 84%