Effect of Co+-ion implantation on the composition and properties of free Si–Cu nanofilm structures

Исаханов, З. А.; Kodirov, T.; Halmatov, A. S.; Рузибаева, М. К.; E., None Мuhtarov Z.; Umirzakov, B. E.

doi:10.1134/s1027451017010128

Cited by 4 publications

(1 citation statement)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…When implanting small doses (D  10 16 ioncm -2 ) of the alloying element, dilute ion-implanted alloys with an impurity element concentration of ~ 1 at. % are formed [10][11][12][13][14][15]. The depth of the maximum content of the alloying element in the surface layer of the crystal is mainly determined by the ion energy of the impurity element [17,18].…”

Section: Resultsmentioning

confidence: 99%

Distribution of Molybdenum Atoms over Depth of the Surface Layer of a Niobium Single Crystal Produced by Ion Bombardment

Ergashov¹,

Donaev²

2022

J. Nano- Electron. Phys.

View full text Add to dashboard Cite

One of the fundamental directions in the use of ion implantation of metals is the creation of surface alloys of any composition. And their quantitative characteristic is the distribution of atoms of the impurity element in depth of the surface layer of the metal substrate [1][2][3][4][5]. In the study of the contribution of each component in changing the electronic structure, emission-adsorption and catalytic properties of multicomponent metal alloys, the creation of particularly pure metal solid solutions, as well as the determination of the actual concentration of alloying elements and their distribution in the surface layer of crystals are of great value. To study the distribution profiles of the concentration of ion-implanted atoms of refractory metals in alloys based on refractory metals, the method of layer-by-layer analysis using Auger electron spectroscopy in conjunction with an argon ion cannon is used. In this work, on the example of implantation of low-energy molybdenum ions into a single crystal of niobium facet (100), the features of creating surface alloys based on refractory metals with a low concentration of the alloying element and the distribution of the ion-implanted metal in the near-surface region of the crystal are studied [5][6][7][8][9].

show abstract

Section: Resultsmentioning

confidence: 99%

Distribution of Molybdenum Atoms over Depth of the Surface Layer of a Niobium Single Crystal Produced by Ion Bombardment

Ergashov¹,

Donaev²

2022

J. Nano- Electron. Phys.

View full text Add to dashboard Cite

show abstract

Enhancing the magnetic anisotropy energy by tuning the contact areas of Ag and Ni at the Ag/Ni interface

Chow

Jiang

Chang

et al. 2018

Phys. Chem. Chem. Phys.

View full text Add to dashboard Cite

Modifying the interfacial conditions of magnetic layers by capping with overlayers can efficiently enhance the magnetic functionality of a material. However, the mechanisms responsible for this are closely related to the crystalline structure, compositional combinations, and interfacial quality, and are generally complex. In this contribution, we explored the use of Ag ultrathin overlayers on annealed . A method for preparing magnetic layers with different levels of enhanced magnetic anisotropy energy was developed. The method essentially involves simply modifying the contact area of the metallic/magnetic interface. A rougher interface results in a larger contact area between the Ag and Ni layers, resulting in an increase in magnetic anisotropy energy. Moreover, post-annealing treatments led to the segregation of Ni atoms, thus making the enhancement in the coercive force even more efficient. A model permits an understanding of the contact area and a strategy for enhancing the magnetic anisotropy energy and the coercive force was developed. Our approaches and the developed model promise to be helpful in terms of developing potential applications of ultrathin magnetic layers in the area of spintronics.

show abstract

Formation of Nanodimensional SiO2 Films on the Surface of a Free Si/Cu Film System by $${\text{O}}_{2}^{ + }$$ Ion Implantation

et al. 2019

View full text Add to dashboard Cite

Effect of Co+-ion implantation on the composition and properties of free Si–Cu nanofilm structures

Cited by 4 publications

References 4 publications

Distribution of Molybdenum Atoms over Depth of the Surface Layer of a Niobium Single Crystal Produced by Ion Bombardment

Distribution of Molybdenum Atoms over Depth of the Surface Layer of a Niobium Single Crystal Produced by Ion Bombardment

Enhancing the magnetic anisotropy energy by tuning the contact areas of Ag and Ni at the Ag/Ni interface

Formation of Nanodimensional SiO2 Films on the Surface of a Free Si/Cu Film System by $${\text{O}}_{2}^{ + }$$ Ion Implantation

Contact Info

Product

Resources

About