2012
DOI: 10.1016/j.apsusc.2012.05.034
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Effect of annealing temperature on properties of RF sputtered Cu(In,Ga)Se2 thin films

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Cited by 27 publications
(7 citation statements)
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“…Recently, efforts have been made to fabricate CIGS layers by sputtering. To further reduce the fabrication costs, a one-step sputtering has been developed [7][8][9][10] to deposit CIGS films without selenization. Frantz et al [7] prepared CIGS solar cell with an efficiency of up to 8.9 % through one-step radio frequency (RF) sputtering at T sub of 550°C.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, efforts have been made to fabricate CIGS layers by sputtering. To further reduce the fabrication costs, a one-step sputtering has been developed [7][8][9][10] to deposit CIGS films without selenization. Frantz et al [7] prepared CIGS solar cell with an efficiency of up to 8.9 % through one-step radio frequency (RF) sputtering at T sub of 550°C.…”
Section: Introductionmentioning
confidence: 99%
“…Zhou et al [2] had studied the effects of substrate temperature, working pressure and sputtering power on the crystallinity, grain size, and microstructure of the CIGS films deposited by one-step RF magnetron sputtering, and found an obvious preferred orientation of (220)/(204) at high sputtering power and high working pressure. By the way, previously almost all the CIGS films prepared by one-step sputtering process were random or (112)-oriented [3][4][5][6][7][8][9][10][11][12][13]. Siebentritt et al [14] and Jiang et al [15] indicated that the preferred orientation of (220)/(204) in CIGS film is beneficial to enhance the property of photovoltaic device.…”
Section: Introductionmentioning
confidence: 99%
“…There are various fabrication methods for CIGS film, where co-evaporation process is a typical method [1]. In recent years, one-step magnetron sputtering process [2][3][4][5][6][7][8][9][10][11][12][13] is developed and presents a potential application in preparing CIGS film. For the one-step sputtering process, a quaternary CIGS ceramic target is directly employed, which is evidently simple in the preparation process of CIGS film.…”
Section: Introductionmentioning
confidence: 99%
“…The sputtering method has received a great deal of attention owing to its flexibility for mass production, fast deposition rates and stoichiometric transfer of target materials to films on the substrate 2) . Nevertheless, CIGS films prepared by sputtering have been shown to be Se deficient due to Se high vapor pressure 7) . Therefore, selenization is frequently required to obtain accurate stoichiometric CIGS films and high cell efficiencies.…”
Section: Introductionmentioning
confidence: 99%
“…High efficiency CIGS films have been prepared by selenization in an H2Se gas atmosphere; however, it is nearly impossible to effectively implement this process in industry due to the extreme toxicity of H2Se gas 7) . Currently, the evaporation of Se pellets or powder instead of toxic H2Se gas is being widely researched [8][9][10] .…”
Section: Introductionmentioning
confidence: 99%