2016
DOI: 10.1039/c6ra04516b
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Eco-friendly photolithography using water-developable pure silk fibroin

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Cited by 48 publications
(55 citation statements)
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References 32 publications
(33 reference statements)
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“…Silk fibroin solution was first spin-coated onto the silica substrate, then SF film was illuminated by ArF excimer laser through a patterned Cr mask. After developing the exposed area with distilled water, the patterned SF film showed diffracted colors with a minimum line width of 1 µm [99]. Another technique is soft lithography, which is based on molding and printing with an elastomeric stamp to realize pattern transfer from the template.…”
Section: Structure Design Of Silk Fibroin-based Biomaterialsmentioning
confidence: 99%
“…Silk fibroin solution was first spin-coated onto the silica substrate, then SF film was illuminated by ArF excimer laser through a patterned Cr mask. After developing the exposed area with distilled water, the patterned SF film showed diffracted colors with a minimum line width of 1 µm [99]. Another technique is soft lithography, which is based on molding and printing with an elastomeric stamp to realize pattern transfer from the template.…”
Section: Structure Design Of Silk Fibroin-based Biomaterialsmentioning
confidence: 99%
“…3B), indicating that the peptide scission is accompanied by structural transition from β-sheet to random coil or helix (Fig. 3 C, iii and SI Appendix , Table S1) (49,52). The latter case brings more molecular rearrangement and an associated larger effect on the localized stress field, indicating that crystalline silk-based wrinkle patterns are more susceptible to UV light than amorphous silk (Fig.…”
Section: Protein Conformation and Wrinkle Dynamicsmentioning
confidence: 95%
“…Some researchers went further by replacing the current resists by biosourced polymers soluble in aqueous solutions. Takei et al used derivatives of polysaccharides as negative tone resist for electron beam (e-beam) lithography [6][7][8][9] or for extreme ultra-violet (EUV) lithography 9 whereas Kim et al tested silk as positive and negative tone resists for e-beam 10 or EUV lithography 11 . The polysaccharides of Takei et al were chemically modified with acryloyl groups.…”
Section: Introductionmentioning
confidence: 99%