1996
DOI: 10.1116/1.589051
|View full text |Cite
|
Sign up to set email alerts
|

Dynamic motion of mask membrane in x-ray stepper

Abstract: This article presents a new analysis method and experimental results for the deflection and vibration of x-ray masks, which are caused by the squeeze effect of the gas film between a mask and a wafer in x-ray steppers. The deflection and vibration occur when a mask-to-wafer gap setting is executed or if the wafer vibrates in the mask direction during stepping motion with a narrow gap. They are not only detrimental to the throughput, but may also damage the mask membrane. Lees’ difference approximation method i… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

1998
1998
2005
2005

Publication Types

Select...
3

Relationship

1
2

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 0 publications
0
2
0
Order By: Relevance
“…3 In this article, a new analysis method for case ͑c͒, in which the deflection is caused by the wedge action of the gas film between the mask and the wafer, is described and the calculation results, which show good agreement with the experimental data 1 obtained by Canon Inc., are discussed. 3 In this article, a new analysis method for case ͑c͒, in which the deflection is caused by the wedge action of the gas film between the mask and the wafer, is described and the calculation results, which show good agreement with the experimental data 1 obtained by Canon Inc., are discussed.…”
Section: Introductionmentioning
confidence: 67%
“…3 In this article, a new analysis method for case ͑c͒, in which the deflection is caused by the wedge action of the gas film between the mask and the wafer, is described and the calculation results, which show good agreement with the experimental data 1 obtained by Canon Inc., are discussed. 3 In this article, a new analysis method for case ͑c͒, in which the deflection is caused by the wedge action of the gas film between the mask and the wafer, is described and the calculation results, which show good agreement with the experimental data 1 obtained by Canon Inc., are discussed.…”
Section: Introductionmentioning
confidence: 67%
“…A unique feature of the squeeze effect is that it provides load carrying capacities without a supply of compressed air or relative slide motion, whereas aerostatic and the hydrodynamic guideways based on wedge effects have additional requirements. These factors are utilized for analysis of the squeeze film damper (Lin et al 2002), silicon accelerometer, quartz resonators (Veijola et al 1995;Andrews et al 1995), and deflection of a mask membrane when a wafer approaches (Uchida et al 1996). A research study was conducted in order to further explore practical applications of squeeze gas bearings in the 1960s.…”
Section: Introductionmentioning
confidence: 99%