Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging

Moon, Euclid E.; Mondol, Mark K.; Everett, Patrick N.; Smith, Henry I.

doi:10.1116/1.2101725

Cited by 21 publications

(9 citation statements)

References 3 publications

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“…Moon et al, have tested a method called Interferometric Spatial Phase Imaging (ISPI) to achieve this sort of image placement. 12 In ISPI, position information is encoded in the spatial phase of interference fringes. An interferometric moiré pattern is formed by the interference of beams diffracted from periodic structures on the mask and substrate.…”

Section: Pattern Density Enhancementsmentioning

confidence: 99%

Step and flash imprint lithography template fabrication for emerging market applications

Resnick¹,

Schmid²,

Miller³

et al. 2007

SPIE Proceedings

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TheStep and Flash Imprint Lithography (S-FIL TM ) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process.

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Section: Pattern Density Enhancementsmentioning

confidence: 99%

Step and flash imprint lithography template fabrication for emerging market applications

Resnick¹,

Schmid²,

Miller³

et al. 2007

SPIE Proceedings

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show abstract

“…[2][3][4] In the new case of substrate back side marks the operating range is increased in X, Y, and Z and is limited only by the size of the substrate back side mark and the spatial coherence of the illumination. 2͒ consists of a single-period p 2 checkerboard on the substrate, which is the same in X and Y. Complementary to this back side checkerboard is a bifurcated grating mark on the upper ͑template͒ surface, consisting of grating periods p 1 and p 3 that are, respectively, larger and smaller than the checkerboard period ͑p 1 Ͼ p 2 Ͼ p 3 ͒.…”

Section: B Back Side Mark Designmentioning

confidence: 99%

Nanometer-level alignment to a substrate-embedded coordinate system

Moon

Smith

2008

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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The authors describe a method that uses infrared (IR) radiation to detect alignment on the nanometer level between grating marks on the front side of a template and a checkerboard-type mark on the back side of an IR-transparent, double-side-polished substrate. The mark can cover the entire substrate back side. No alignment marks are required on the front of the substrate. A back-side-specific mark is utilized with λ=1065nm illumination to detect alignment within σ=0.4nm.

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“…11 Moon et al, have tested a method called Interferometric Spatial Phase Imaging (ISPI) to achieve this sort of image placement. The best image placement currently available from an electron beam system is closer to 5nm.…”

Section: Feature Placementmentioning

confidence: 99%

Template Fabrication Challenges for Patterned Media

Resnick¹,

Schmid²,

Miller³

et al. 2006

MRS Proc.

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The Step and Flash Imprint Lithography (S-FIL TM ) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where highresolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both patterned media and photonic crystal devices using a large area printing tool developed around the S-FIL process. Techniques for further enhancing the pattern density as well as a method for addressing feature image placement are described. Finally, a process for replicating a Master Template is discussed in detail.

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Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging

Cited by 21 publications

References 3 publications

Step and flash imprint lithography template fabrication for emerging market applications

Step and flash imprint lithography template fabrication for emerging market applications

Nanometer-level alignment to a substrate-embedded coordinate system

Template Fabrication Challenges for Patterned Media

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