Step and flash imprint lithography template fabrication for emerging market applications

Abstract

TheStep and Flash Imprint Lithography (S-FIL TM ) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process.

Nanoimprint lithography: 2D or not 2D? A review

“…The typical pattern transfer process in NIL is the residual layer (window opening, breakthrough) etch, followed by the transfer into the substrate [106][107][108][109][110][111][112][113][114][115][116][117][118][119][120][121][122]. This can be done by anisotropic proportional etching, as long as a sufficient ''resist height budget'' is provided.…”

Microfluidic Photomask Design Using CAD Software for Application in Lab-On-Chip Biomedical Nanodiagnostics

“…The design of a mask is originated from a computer-aided-design (CAD) software data file. It is then converted to a series of polygons and written onto a square fused quartz substrate covered with a layer of chromium using a photolithographic process [1][2][3]5]. Then, the mask manufactured in either a vector or raster scan manner by using a laser beam or e-beam writer [3].…”

“…Then, the mask manufactured in either a vector or raster scan manner by using a laser beam or e-beam writer [3]. When the photoresist on the mask is exposed, the chrome can be etched away, leaving a clear path for the UV illumination light in the stepper system to travel through [4,5].…”

Nanoimprint Lithography

“…Half pitches of 21nm, using a PMMA lift-off process were formed on a template and imaged using an Imprio-1100 step and flash imprint lithography full wafer production tool. The templates have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process (Resnick et al, 2007). Haatainen et al, proposed a step & stamp imprint lithography technique (SSIL) to produce large area metal stamps with wafer size up to 100 mm with 100 nm patterns.…”