Template Fabrication Challenges for Patterned Media

Resnick, Douglas J.; Schmid, Gerard M.; Miller, Mike; Doyle, Gary; Jones, Christopher E.; LaBrake, Dwayne

doi:10.1557/proc-0961-o02-03

Cited by 3 publications

(1 citation statement)

References 7 publications

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“…An example is shown in Figure 13. (34) Imprint is the preferred solution for this application given the lower cost and ability to print larger fields (up to 3.5" disks) when compared to photolithography. With over a billion disk drives produced each year, this market alone will be hundreds of tools.…”

Section: Application Of Imprint To Cmosmentioning

confidence: 99%

Front Matter: Volume 6517

Lercel¹

2007

SPIE Proceedings

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SPIE is an international technical society dedicated to advancing engineering and scientific applications of optical, photonic, imaging, electronic, and optoelectronic technologies. PROCEEDINGS OF SPIEDownloaded From: http://proceedings.spiedigitallibrary.org/ on 06/25/2016 Terms of Use: http://spiedigitallibrary.org/ss/TermsOfUse.aspxThe papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.Please use the following format to cite material from this book:Pagination: Proceedings of SPIE follow an e-First publication model, with papers published first online and then in print and on CD-ROM. Papers are published as they are submitted and meet publication criteria. A unique, consistent, permanent citation identifier (CID) number is assigned to each article at the time of the first publication. Utilization of CIDs allows articles to be fully citable as soon they are published online, and connects the same identifier to all online, print, and electronic versions of the publication.SPIE uses a six-digit CID article numbering system in which:• The first four digits correspond to the SPIE volume number.• The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc.The CID number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages.

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Section: Application Of Imprint To Cmosmentioning

confidence: 99%

Front Matter: Volume 6517

Lercel¹

2007

SPIE Proceedings

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P1–15: Patterning of high density magnetic nanodot arrays by imprint lithography with hole tone template

Xu¹,

Hu²,

Yang³

et al. 2010

International Vacuum Nanoelectronics Conference

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Nanoimprint Lithography presents unique opportunities for high density patterning due to its advantages of sub-10nm resolution capability and high throughput. Imprint and pattern transfer with Pillar tone template were widely studies recently. However, there are several critical issues that still remain very challenging, including fabrication of pillar templates and pattern reverse from imprint holes to nano dots array at high density.In this Paper, we will demostrated the feasibility of imprint with hole tone template and its application in highdensity nanodot array patterning. The authors have successfully demonstrated hole-tone template fabrication process and pattern transfer results with imprint pillar. The profile of imprint resist pillar was analyzed with crosssection scanning electron microscope(SEM). Pattern was transferred to underneath Co alloy thin films by ion beam milling into aligned dots with pitch of 50nm. Magnetic dots array were investigated with SEM and M-H loop measurement.Strong perpendicular anisotropy was induced by the patterning process. Magnetic measurement reveals through ion milling process, magnetization reversal was changed from domain wall pinning dominated to Stoner-Wohlfarth coherent rotation dominated. Coercivity and Remanence change during Ion beam etching were discussed. Extendibility to ultra-high density patterning is also investigated. Results: Fig.1.(a) SEM of Hole-tone template at 250G/in2 densityFig.1.(b) SEM of Imprint resist pillarFig.1.(c) Patterned transfer to magnetic dot array Bulleted and Numbered Lists: All bulleted and numbered lists should not have any additional indent and the text Fig.2 M-H loops of magnetic dot array with various etch depth (a) (b) (c) (d) 58 978-1-4244-7887-3/10/$26.00

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Toward 1Tdot∕in.2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges

Yang

Seiler

et al. 2008

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Nanoimprint lithography presents unique opportunities for patterned media applications due to its advantages of sub-10nm resolution capability, patterning of a whole disk in a single imprint step with reasonably high throughput, and the relatively low capital cost in comparison to other next generation lithography technologies. However, there are several critical issues that still remain very challenging. This article will briefly discuss these challenges in general and then focus on imprint lithography work including the fabrication of templates and demonstrate the imprinted results. In this work two types of polarities of high-density templates (pillar tone and hole tone) have been fabricated on fused silica substrates for the UV imprint process. The difficulties and limitations in each of the template fabrication processes will be discussed. The authors have successfully demonstrated template fabrication followed by imprinted results with a pitch of 24nm (1.1Tdots∕in.2) for both tones of templates. Initial imprinted results of dense dot patterns with a pitch as small as 18nm (2.0Tdots∕in.2) have been achieved. High-resolution scanning electron microscopy images are used as the primary metrology for both the dot size uniformity and the placement accuracy analysis. The difficulties and the limitations in template fabrication, the imprint process, and associated metrology will be discussed.

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Template Fabrication Challenges for Patterned Media

Cited by 3 publications

References 7 publications

Front Matter: Volume 6517

Front Matter: Volume 6517

P1–15: Patterning of high density magnetic nanodot arrays by imprint lithography with hole tone template

Toward 1Tdot∕in.2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges

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Template Fabrication Challenges for Patterned Media

Cited by 3 publications

References 7 publications

Front Matter: Volume 6517

Front Matter: Volume 6517

P1&#x2013;15: Patterning of high density magnetic nanodot arrays by imprint lithography with hole tone template

Toward 1Tdot∕in.2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges

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P1–15: Patterning of high density magnetic nanodot arrays by imprint lithography with hole tone template