Dual mode of deep oscillation magnetron sputtering

Oskirko, V. O.; Zakharov, A. N.; Pavlov, A. P.; Solovyev, A. A.; Grenadyorov, A. S.; Semenov, V. A.

doi:10.1016/j.surfcoat.2020.125559

Cited by 9 publications

(3 citation statements)

References 37 publications

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“…A more simple, yet similar, approach is the deep oscillation magnetron sputtering (DOMS), where a macropulse is composed of a burst of micropulses [17][18][19][20][21][22][23]. As compared to the short-pulsed HiPIMS (e.g.…”

Section: Introductionmentioning

confidence: 99%

Dynamics of sputtered particles in multipulse HiPIMS discharge

Hnilica¹,

Klein²,

Vašina³

et al. 2023

Plasma Sources Sci. Technol.

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The behavior of the ground state neutral and singly ionized atoms is studied in multipulse high power impulse magnetron sputtering processes. The time-resolved two-dimensional laser induced ﬂuorescence was used for imaging the discharge volume (density mapping) during the plasma-on and plasma-oﬀ time phases. The role of the number of micropulses and delay time between the micropulses in the pulse package is analyzed and discussed systematically. In addition, the propagation of the sputtered particles from the target is investigated.

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Section: Introductionmentioning

confidence: 99%

Dynamics of sputtered particles in multipulse HiPIMS discharge

Hnilica¹,

Klein²,

Vašina³

et al. 2023

Plasma Sources Sci. Technol.

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“…Both of these techniques have been proposed as new methods to increase the deposition rate by avoiding arcs in DOMS and reducing metal ion back-attraction in m-HiPIMS. Furthermore, very recently, bipolar-DOMS has been developed as a new method that combines the elements of DOMS and m-HiPIMS [22,23].…”

Section: Introductionmentioning

confidence: 99%

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

Sanekata

Nishida

Nakagomi

et al. 2021

Plasma

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Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES). Delays in discharge and the formation of comb-like discharge current waveforms due to splitting and pulsing were observed with a decrease in pressure. This observation corresponds to the evolution from MPPMS condition to deep-oscillation-magnetron-sputtering (DOMS)-like condition by changing discharge gas pressure. The optical emission intensities of the ionic species (Ar+ and Ti+) increased as the comb-like current waveforms were formed with decreasing Ar pressure. This behavior showed a marked contrast to that of the neutral species (Ar and Ti). The Ar pressure dependence of OES was revealed to be due to the plasma build-up stage, which is the initial generation process of plasma discharge in pulsed dc magnetron sputtering, from the temporal profile for the atomic-line intensities of the optically emitting species in MPPMS and DOMS-like plasmas.

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“…It has been shown that in some cases of high-power pulsed reactive sputtering processes, the hysteresis effects tend to mitigate, thus alleviating the requirements for gas supply control systems, while in others they do not appear at all [24,27,28], which is beneficial for coating deposition applications. However, the challenges for stable efficient deposition processes of high-quality compound (and especially transparent oxide) thin films still remain and stimulate refining of the pulsed magnetron techniques as well as developing of the novel ones [e.g., deep oscillation magnetron sputtering (DOMS) [29][30][31][32][33]].…”

Section: Introductionmentioning

confidence: 99%

Properties of millisecond-scale modulated pulsed power magnetron discharge applied for reactive sputtering of zirconia

Kaziev

Kolodko

Sergeev

2021

Plasma Sources Sci. Technol.

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The electrical properties of a modulated pulsed power (MPP) magnetron discharge were experimentally and theoretically studied in case of reactive sputtering of metallic zirconium target in argon/oxygen mixtures. The high-power pulsing was assisted by pre-ionization provided by a low-power direct current (DC) magnetron discharge filling the pulse-off period. The ranges of stable discharge operation parameters (applied voltage and oxygen flow rate) were determined for pulse-on time of 3 ms and pulse-off time 100–1000 ms. The maximum stable peak power density was 2.1 kW cm−2. Strong dependence of the MPP discharge current waveforms on the pulse-off time was found, indicating the important role of the pre-ionizing DC discharge. In presence of oxygen, discharge peak current was observed with characteristic width up to 1.5 ms, followed by non-reactive-like plateau region. For theoretical treatment of the observed discharge current behavior, we modified the well-known Berg model of reactive sputtering by introducing the terms required for adequate description of time-dependent poisoning and sputtering processes. The reactive ion implantation term was also transformed to account for the process saturation at high ion current densities. Calculation results from the modified Berg model demonstrated good agreement between our experimental observations of discharge current evolution and target poisoning dynamics in the timescale of milliseconds.

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Dual mode of deep oscillation magnetron sputtering

Cited by 9 publications

References 37 publications

Dynamics of sputtered particles in multipulse HiPIMS discharge

Dynamics of sputtered particles in multipulse HiPIMS discharge

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

Properties of millisecond-scale modulated pulsed power magnetron discharge applied for reactive sputtering of zirconia

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