1987
DOI: 10.1109/edl.1987.26677
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Double-gate silicon-on-insulator transistor with volume inversion: A new device with greatly enhanced performance

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Cited by 713 publications
(317 citation statements)
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“…In applications like the DGMOS [4], the frontier ∂ω × [0, 1] includes the source and the drain contacts as well as an insulating or artificial boundary. On the other hand, ω × {0} and ω × {1} represent the gate contacts (in addition to possible insulating boundaries).…”
Section: Introduction and Main Resultsmentioning
confidence: 99%
“…In applications like the DGMOS [4], the frontier ∂ω × [0, 1] includes the source and the drain contacts as well as an insulating or artificial boundary. On the other hand, ω × {0} and ω × {1} represent the gate contacts (in addition to possible insulating boundaries).…”
Section: Introduction and Main Resultsmentioning
confidence: 99%
“…The 2D solutions of the Schrödinger equation are obtained in each cross-section along the gate length of the simulated transistor. The 2D Schrödinger equation is solved in an effective mass approximation [19][20][21][22][23][24][25]. The charge distribution obtained from the solutions of the 2D Schrödinger equation is used to calibrate the effective quantum-corrected potential in DD module.…”
Section: Simulation Methodologymentioning
confidence: 99%
“…Theoretical analysis of double-gate (DG) transistors dates back to 1967 [5], about the same time as bulk MOSFET models. Since 1980's many alternatives to the conventional bulksilicon MOSFET have been proposed and developed, such as the silicon-on-insulator (SOI) and double-gate MOSFETs [6][7][8][9][10]. Theoretically, this type of "generic" MOSFETs has a different boundary condition from bulk MOSFET due to the back-gate oxide.…”
Section: Introductionmentioning
confidence: 99%