Conference Record of the Twenty-Ninth IEEE Photovoltaic Specialists Conference, 2002.
DOI: 10.1109/pvsc.2002.1190516
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Double anti-reflection layers for silicon solar cells obtained by spin-on

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“…Methods developed to maximize the optical absorption in silicon solar cells through surface texturization by acid or alkaline etch 14,15 are not applicable in thin film silicon solar cell because the etch-pitch dimension surpasses the film thickness. The application of antireflective coatings like TiO 2 , SiO 2 , etc., 16 alone may not suffice to increase the light generated current, because the necessity to increase the optical path length is not complied. Enhanced light trapping by grating structures of 500-700 nm pitch and 300-500 nm height on the front and/or back surfaces along with the use of appropriate reflector films and antireflective coatings considerably increases the light trapping and hence the J sc in thin film Si solar cells.…”
mentioning
confidence: 99%
“…Methods developed to maximize the optical absorption in silicon solar cells through surface texturization by acid or alkaline etch 14,15 are not applicable in thin film silicon solar cell because the etch-pitch dimension surpasses the film thickness. The application of antireflective coatings like TiO 2 , SiO 2 , etc., 16 alone may not suffice to increase the light generated current, because the necessity to increase the optical path length is not complied. Enhanced light trapping by grating structures of 500-700 nm pitch and 300-500 nm height on the front and/or back surfaces along with the use of appropriate reflector films and antireflective coatings considerably increases the light trapping and hence the J sc in thin film Si solar cells.…”
mentioning
confidence: 99%