At real tellurium surfaces natural accumuIation layers exist which can be changed substantially by different etching processes. For pure samples this surface layer may mask the galvanomagnetic properties of the bulk completely. Employing a new etching process the influence of the surface can be reduced drastically, complete elimination is possible using a field effect arrangement. A comparison of the results obtained from samples with different degrees of accumulation at the surface allows a separation of the galvanomagnetic properties of the surface and the bulk.