2016
DOI: 10.1016/j.mee.2016.02.056
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Dopant imaging of power semiconductor device cross sections

Abstract: Several Scanning Probe Microscopy (SPM) methods allow to image dopant profiles in a range from 10 14 cm-3 to 10 19 cm-3 on semiconducting samples. In our work we present Scanning Capacitance Force Microscopy (SCFM) and Kelvin Probe Force Microscopy (KPFM) experiments performed on cross sections of silicon (Si) and silicon carbide (SiC) power devices and epitaxially grown calibration layers. The KPFM signals show under illumination a reduced influence on surface defect states. In addition results from numerical… Show more

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Cited by 11 publications
(14 citation statements)
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References 9 publications
(11 reference statements)
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“…Another common area of application of KPFM is the analysis of semiconductors. 352,355,356 Here, the KPFM method is sensitive enough to determine the dopant concentration in the range of 10 14 cm À3 to 10 19 cm À3 . 356 However, the contact potential difference is altered by surface defects, 357 exploitable for detecting of defects.…”
Section: Combination Of Afm With Kelvin Methods -Kelvin Probe Force MImentioning
confidence: 99%
See 2 more Smart Citations
“…Another common area of application of KPFM is the analysis of semiconductors. 352,355,356 Here, the KPFM method is sensitive enough to determine the dopant concentration in the range of 10 14 cm À3 to 10 19 cm À3 . 356 However, the contact potential difference is altered by surface defects, 357 exploitable for detecting of defects.…”
Section: Combination Of Afm With Kelvin Methods -Kelvin Probe Force MImentioning
confidence: 99%
“…352,355,356 Here, the KPFM method is sensitive enough to determine the dopant concentration in the range of 10 14 cm À3 to 10 19 cm À3 . 356 However, the contact potential difference is altered by surface defects, 357 exploitable for detecting of defects. 358 By illumination with a sub-bandgap laser, band bending is reduced and higher contrast in CPD in conjunction with reduced inuence on surface defect states is achieved.…”
Section: Combination Of Afm With Kelvin Methods -Kelvin Probe Force MImentioning
confidence: 99%
See 1 more Smart Citation
“…Kelvin probe force microscopy (KFM) is a technique used to quantitatively characterize such electrical proper-ties [1][2][3]. It is applied to map material compositions via changes in the work function, to localize charge distributions in dielectric samples [4,5], and to characterize doping profiles via scanning capacitance measurements [6]. Especially in the field of nanoelectronic devices, this kind of electrical characterizations is of great interest.…”
Section: Introductionmentioning
confidence: 99%
“…Namely, a static component (dc) as well as components at the modulation frequency ω m and at the second harmonic frequency 2ω m . These spectral components are defined by (5) with (6) (7) and (8) In conventional frequency-modulated (FM-) KFM, the contributions at ω m and 2ω m are detected via lock-in techniques, either at the Δf output of a phase-locked loop (PLL) [12] or by detecting the sidebands of the cantilever oscillation [13].…”
Section: Introductionmentioning
confidence: 99%