Displacive radiation-induced structural contraction in nanocrystalline ZrN

Toughness enhancement in zirconium-tungsten-nitride nanocrystalline hard coatings

“…Simultaneously, intensive ion bombardment increases the localized temperature i.e., an additional thermal energy, which leads to a higher mobility of adatoms. It can be observed that the intensity of (111) peak decreases with increasing U k , except at U k =99 J/cm 3 . At U k ≤73 J/cm 3 , most part of the kinetic energy of the ions is transferred to adatoms to penetrate into the atomic layers, thereby increasing the surface mobility and decreasing the intensity of (111) peak.…”

“…At U k ≤73 J/cm 3 , most part of the kinetic energy of the ions is transferred to adatoms to penetrate into the atomic layers, thereby increasing the surface mobility and decreasing the intensity of (111) peak. The (002) to (111) texturing transition at maximum U k (99 J/cm 3 ) is attributed to point defect growth. [14][15][16] The XRD data ( Fig.…”

“…Moreover, ion-bombardment induced compressive stress can contribute to higher K IC . 3 In this context, here in this letter, we report an approach to realize ZrWN coatings with toughness enhancement while retaining the traditional high-H of nitrides. It is demonstrated that the substrate bias combined with nano-morphology allows to produce mechanically high-quality ZrWN coatings at relatively low temperature (200…”

“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18] Since the very first successful commercialization of TiN, the field of nitrides has become widespread and diversified to include other complex applications such as automotive, aerospace, microelectronics, and biomedical technologies. [15][16][17][18][19][20] However, rapid progress made coupled with ever increasing demand for performance and efficiency enhancement and current nanotechnology challenges are the prime factors constantly driving the thrust to design new coating materials and/or new architectures to further improve the properties and high-temperature stability of the coatings.…”

“…The target to substrate distance was fixed at 6 cm. The negative bias voltage applied on the substrate was varied in the range of -20 to -120 V, for which the corresponding ion energies (U k ) were varied in the range of 9-99 J/cm 3 . The curvature of uncoated and coated substrate was determined by using Stylus profilometer (XP-2).…”