2020
DOI: 10.1049/el.2020.1286
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Dispersion effects in on‐state resistance of lateral Ga 2 O 3 MOSFETs at 300 V switching

Abstract: Static characterisation and fast switching processes of lateral β-Ga 2 O 3 metal oxide semiconductor field-effect transistors (MOSFETs) are presented. The investigated transistors with 10 mm gate width and 6 µm gate drain distance achieve on-state resistances of 5 Ω and saturation currents above 2.4 A. Hard switching in a double pulse test setup with an inductive load results in voltage slopes up to 65 V/ns at 300 V input voltage. After longer blocking times and higher DC voltages, a strong dynamic increase in… Show more

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Cited by 4 publications
(6 citation statements)
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“…The progress of these vertical Ga 2 O 3 rectifiers is fast, and various edge termination designs have been reported to achieve high V br . For transistors, the only ampere-class Ga 2 O 3 power transistor reported in the literature is the lateral Ga 2 O 3 MOSFET with a saturation current over 2.5 A and V br over 400 V. 17,18) Schematics of the Ga 2 O 3 vertical SBD, JBS diode and HJD, as well as lateral MOSFET, are shown in Fig. 1.…”
Section: Electrical Performancementioning
confidence: 99%
See 2 more Smart Citations
“…The progress of these vertical Ga 2 O 3 rectifiers is fast, and various edge termination designs have been reported to achieve high V br . For transistors, the only ampere-class Ga 2 O 3 power transistor reported in the literature is the lateral Ga 2 O 3 MOSFET with a saturation current over 2.5 A and V br over 400 V. 17,18) Schematics of the Ga 2 O 3 vertical SBD, JBS diode and HJD, as well as lateral MOSFET, are shown in Fig. 1.…”
Section: Electrical Performancementioning
confidence: 99%
“…Static characteristics and switching performance of lateral Ga 2 O 3 MOSFET have also been investigated. 17,18) J. Böcker et al reported a large-area lateral Ga 2 O 3 MOSFET with a R on of 5 Ω and forward saturation current up to 2.5 A, as shown in Fig. 7(a).…”
Section: Switching Performance and Circuit Applicationsmentioning
confidence: 99%
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“…As devices under test (DUTs), commercially available discrete GaN Gate Injection Transistors (GIT) and research level chips of β-Ga2O3 normally-on MOSFETs on test substrates from Ferdinand-Braun-Institut, Berlin [6], were used. Both device types are lateral devices with gold bond wires, bonded on the edges of the chips.…”
Section: Devices Under Test and Test Setupmentioning
confidence: 99%
“…Constructive methods have been proposed to minimize the SHE of β-Ga 2 O 3 MOS-FETs [12,13] , such as the ion-cutting technique [14] , transfer to a foreign substrate [15,16] and structural design [17] . Novel measurements have been used to characterize the transient temperature distribution of β-Ga 2 O 3 MOSFETs [18] . Most reports on β-Ga 2 O 3 -based MOSFETs have focused on pursuing high PFOMs and exploring novel structures, yet large-area structures are needed to sustain a high on-state current for practical applications.…”
Section: Introductionmentioning
confidence: 99%