Memristive devices are able to store and process information, which offers several key advantages over the transistor-based architectures. However, most of the two-terminal memristive devices have fixed functions once made and cannot be reconfigured for other situations. Here, we propose and demonstrate a memristive device "memlogic" (memory logic) as a nonvolatile switch of logic operations integrated with memory function in a single light-gated memristor. Based on nonvolatile light-modulated memristive switching behavior, a single memlogic cell is able to achieve optical and electrical mixed basic Boolean logic of reconfigurable "AND", "OR", and "NOT" operations. Furthermore, the single memlogic cell is also capable of functioning as an optical adder and digital-to-analog converter. All the memlogic outputs are memristive for in situ data storage due to the nonvolatile resistive switching and persistent photoconductivity effects. Thus, as a memdevice, the memlogic has potential for not only simplifying the programmable logic circuits but also building memristive multifunctional optoelectronics.
Boron Nitride (BN) is a two dimensional insulator with excellent chemical, thermal, mechanical, and optical properties, which make it especially attractive for logic device applications. Nevertheless, its insulating properties and reliability as a dielectric material have never been analyzed in-depth. Here, we present the first thorough characterization of BN as dielectric film using nanoscale and device level experiments complementing with theoretical study. Our results reveal that BN is extremely stable against voltage stress, and it does not show the reliability problems related to conventional dielectrics like HfO2, such as charge trapping and detrapping, stress induced leakage current, and untimely dielectric breakdown. Moreover, we observe a unique layer-by-layer dielectric breakdown, both at the nanoscale and device level. These findings may be of interest for many materials scientists and could open a new pathway towards two dimensional logic device applications
In recent years,
Ga2O3 solar-blind photodetectors
(SBPDs) have received great attention for their potential applications
in solar-blind imaging, deep space exploration, confidential space
communication, etc. In this work, we demonstrated an ultra-high-performance
ε-Ga2O3 metal–semiconductor–metal
(MSM) SBPD. The fabricated photodetectors exhibited a record-high
responsivity and fast decay time of 230 A/W and 24 ms, respectively,
compared with MSM-structured Ga2O3 photodetectors
reported to date. Additionally, the ε-Ga2O3 MSM SBPD presents an ultrahigh detectivity of 1.2 × 1015 Jones with a low dark current of 23.5 pA under an operation
voltage of 6 V, suggesting its strong capability of detecting an ultraweak
signal. The high sensitivity and wavelength selectivity of the photodetector
were further confirmed by the record-high responsivity rejection ratio
(R
250 nm/R
400 nm) of 1.2 × 105. From the temperature-dependent electrical
characteristics in the dark, the thermionic field emission and Poole–Frenkel
emission were found to be responsible for the current transport in
the low and high electric field regimes, respectively. In addition,
the gain mechanism was revealed by the Schottky barrier lowering effect
due to the defect states at the interface of the metal contact and
Ga2O3 or in the bulk of Ga2O3 based on current transport mechanism and density functional
theory calculations. These results facilitate a better understanding
of ε-Ga2O3 photoelectronic devices and
provide possible guidance for promoting their performance in future
solar-blind detection applications.
The Pt/β-Ga2O3 Schottky barrier diode and its temperature-dependent current-voltage characteristics were investigated for power device application. The edge-defined film-fed growth (EFG) technique was utilized to grow the (100)-oriented β-Ga2O3 single crystal substrate that shows good crystal quality characterized by X-ray diffraction and high resolution transmission electron microscope. Ohmic and Schottky electrodes were fabricated by depositing Ti and Pt metals on the two surfaces, respectively. Through the current-voltage (I-V) measurement under different temperature and the thermionic emission modeling, the fabricated Pt/β-Ga2O3 Schottky diode was found to show good performances at room temperature, including rectification ratio of 1010, ideality factor (n) of 1.1, Schottky barrier height (ΦB) of 1.39 eV, threshold voltage (Vbi) of 1.07 V, ON-resistance (RON) of 12.5 mΩ·cm2, forward current density at 2 V (J@2V) of 56 A/cm2, and saturation current density (J0) of 2 × 10−16 A/cm2. The effective donor concentration Nd − Na was calculated to be about 2.3 × 1014 cm3. Good temperature dependent performance was also found in the device. The Schottky barrier height was estimated to be about 1.3 eV–1.39 eV at temperatures ranging from room temperature to 150 °C. With increasing temperature, parameters such as RON and J@2V become better, proving that the diode can work well at high temperature. The EFG grown β-Ga2O3 single crystal is a promising material to be used in the power devices.
Gallium oxide (Ga2O3) is a new semiconductor material which has the advantage of ultrawide bandgap, high breakdown electric field, and large Baliga’s figure of merit (BFOM), so it is a promising candidate for the next-generation high-power devices including Schottky barrier diode (SBD). In this paper, the basic physical properties of Ga2O3 semiconductor have been analyzed. And the recent investigations on the Ga2O3-based SBD have been reviewed. Meanwhile, various methods for improving the performances including breakdown voltage and on-resistance have been summarized and compared. Finally, the prospect of Ga2O3-based SBD for power electronics application has been analyzed.
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