2022
DOI: 10.1002/adfm.202202026
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Direct Plasma‐Enhanced‐Chemical‐Vapor‐Deposition Syntheses of Vertically Oriented Graphene Films on Functional Insulating Substrates for Wide‐Range Applications

Abstract: Graphene has inspired wide‐range research interests and practical applications due to its intriguing materials properties and versatile application prospects. Specifically, vertically oriented graphene (VG) constructed by vertically aligned nanosheets emerges as a unique material type, usually achieved through a plasma‐enhanced chemical vapor deposition (PECVD) route. The VG films possess abundant exposed active edges, large surface areas, relatively high electrical conductivity, and excellent thermal property… Show more

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Cited by 14 publications
(9 citation statements)
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“…The direct-CVD growth of graphene relies mainly on the thermal decomposition of the carbon precursor because of the catalytic inertness of the growth substrate, whereas a myriad of substrates is unable to bear an elevated temperature treatment ( e.g., 1000 °C). Note that the PECVD technique enables the facile cracking of carbon precursor with the aid of plasma, which can readily achieve graphene growth under a relatively low temperature . In consequence, more efforts should be devoted to promoting the further development of the low-temperature PECVD route, which would allow the conformal coating of graphene on arbitrary substrates.…”
Section: Possibility Of Direct-cvd-enabled Graphenementioning
confidence: 99%
See 1 more Smart Citation
“…The direct-CVD growth of graphene relies mainly on the thermal decomposition of the carbon precursor because of the catalytic inertness of the growth substrate, whereas a myriad of substrates is unable to bear an elevated temperature treatment ( e.g., 1000 °C). Note that the PECVD technique enables the facile cracking of carbon precursor with the aid of plasma, which can readily achieve graphene growth under a relatively low temperature . In consequence, more efforts should be devoted to promoting the further development of the low-temperature PECVD route, which would allow the conformal coating of graphene on arbitrary substrates.…”
Section: Possibility Of Direct-cvd-enabled Graphenementioning
confidence: 99%
“…Note that the PECVD technique enables the facile cracking of carbon precursor with the aid of plasma, which can readily achieve graphene growth under a relatively low temperature. 199 In consequence, more efforts should be devoted to promoting the further development of the low-temperature PECVD route, which would allow the conformal coating of graphene on arbitrary substrates. In terms of the PECVD growth of graphene on dielectric supports, the metal-catalyst-assisted growth is again appealing owing to the weak catalytic ability of the substrates.…”
Section: Substrate Selectionmentioning
confidence: 99%
“…In this work, a portable electrochemical aptasensing platform is developed for the point-of-care detection of tau protein in the blood. In this electrochemical sensing system, vertical graphene (VG) modified with nanoAu (VG@Au) is used as an electrode material because of its large specific surface area, excellent electrical conductivity, high carrier mobility, good chemical stability, and outstanding biocompatibility [ 32 , 33 ], which improves sensitivity and reduces detection limit. In addition, nanoAu is also used to bind with aptamer.…”
Section: Introductionmentioning
confidence: 99%
“…VGNs were normally prepared by the plasma-enhanced chemical vapor deposition (PECVD) method. 30,31 Different from the conventional thermal CVD methods, PECVD encompasses a generator to induce high-energy plasma in the growth apparatus. The generated plasma can provide extra energy for the decomposition of precursors, accompanied by drastically reduced growth temperature below 600 °C.…”
Section: Introductionmentioning
confidence: 99%
“…Composed of vertically aligned few-layer graphene flakes, VGNs maintain the fantastic electrical properties of graphene. , The combination of the porous nanostructure and favorable electrical conductivity make VGNs a promising EMI shielding material. VGNs were normally prepared by the plasma-enhanced chemical vapor deposition (PECVD) method. , Different from the conventional thermal CVD methods, PECVD encompasses a generator to induce high-energy plasma in the growth apparatus. The generated plasma can provide extra energy for the decomposition of precursors, accompanied by drastically reduced growth temperature below 600 °C .…”
Section: Introductionmentioning
confidence: 99%