2020
DOI: 10.1002/cssc.202001896
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Direct MOCVD Growth of Iron Oxide on Three‐Dimensional Nickel Foam as Electrode for the Oxygen Evolution Reaction

Abstract: Iron oxide thin films were grown directly on three-dimensional nickel foam via metalorganic chemical vapor deposition (MOCVD) in the temperature range of 250-450°C using Fe(CO) 5 as precursor. Iron oxide (α-Fe 2 O 3) films were formed at low substrate temperatures (250-350°C), whereas the additional growth of an underlying NiO film occurred at substrate temperatures above 350°C. The electrochemical activities of the asformed binder-free and noble metal-free electrodes were tested for the oxygen evolution react… Show more

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Cited by 2 publications
(2 citation statements)
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References 29 publications
(40 reference statements)
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“…MOCVD deposition studies were performed using a home‐made low‐pressure reactor [29] at 500 °C on Al 2 O 3 (0001), Si(001) and Pt substrates with synthetic air as oxidizer and carrier gas. 0.3 mmol precursor were used for each deposition run.…”
Section: Resultsmentioning
confidence: 99%
“…MOCVD deposition studies were performed using a home‐made low‐pressure reactor [29] at 500 °C on Al 2 O 3 (0001), Si(001) and Pt substrates with synthetic air as oxidizer and carrier gas. 0.3 mmol precursor were used for each deposition run.…”
Section: Resultsmentioning
confidence: 99%
“…Stienen et al utilized the direct metalorganic chemical vapor deposition (MOCVD) method to deposit a coating layer of a-Fe 2 O 3 to nickel foam (Fe 2 O 3 @NiF-450) with great uniformity by oxidizing and decomposing Fe(CO) 5 at a high temperature of 450 1C. 104 This material was advantageous due to its three-dimensional framework, which allowed greater contact between the a-Fe 2 O 3 and the electrolyte. As a result, when tested in 1 M KOH, it was found to have an OER overpotential of 370 mV (@ 10 mA cm À2 ) and a Tafel slope of 55 mV dec À1 .…”
Section: Nife-based Oer Electrodesmentioning
confidence: 99%