Direct Laser Interference Patterning: Theory and Application

Zabila, Y.; Perzanowski, Marcin; Dobrowolska, Agnieszka; Kąc, M.; Polit, A.; Marszałek, M.

doi:10.12693/aphyspola.115.591

Cited by 28 publications

(18 citation statements)

References 6 publications

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“…The two-dimensional diffraction grating on the Bi film was prepared by direct laser interference patterning (DLIP) method described elsewhere [9][10][11]. A pulsed Q-switched Nd:YAG laser (Quantel YAG980) operating at 532 nm with pulse duration of 10 ns and 10 Hz repetition rate was used as a light source.…”

Section: Kaptonmentioning

confidence: 99%

Optical Diffraction Strain Sensor Prepared by Interference Lithography

et al. 2018

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An optical strain sensor was developed for use in stretchable electronics. It consists of a diffraction grating formed directly on the examined surface illuminated by a laser beam which creates interference pattern. This pattern can then be used to determine axial and lateral strains for a uniaxial stress states. Direct laser interference patterning was employed as a fast processing tool for the preparation of micro-and sub-microgratings. Two coherent beams of Nd:YAG laser with 532 nm wavelength and pulse duration of 10 ns were used to selectively remove material from the irradiated sample surface. This technique creates periodic pattern on the metallized surface of polymeric substrates. New sensors formed by direct laser interference patterning method were able to resolve higher order diffraction maxima, which would be of benefit for strain measurement application. Experimental setup for tensile tests was composed of laser probe, the sensor element, and CCD camera. To extract strain values, we analysed acquired interference pattern images in real time software, developed with LabVIEW environment. This kind of contactless strain sensor is suitable for examination of stretchable electronics component for which conventional tensile tests are either not acceptable or can interfere with its normal operation.

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Section: Kaptonmentioning

confidence: 99%

Optical Diffraction Strain Sensor Prepared by Interference Lithography

et al. 2018

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“…Among them, four-beam laser interference lithography is the most extensively investigated technology. 16,[25][26][27][28][29][30][31][32][33][34] Theoretically, four-beam laser interference could generate evenly distributed periodic structure patterns, but in practice, noticeable modulations were almost unavoidably introduced in interference patterns due to the misalignment of incident angles or unequal incident angles, 25,31-33 which is not desired for many applications.…”

Section: Effects Of Polarization On Four-beam Laser Interference Lithmentioning

confidence: 99%

Effects of polarization on four-beam laser interference lithography

Wang¹,

Wang²,

Zhang³

et al. 2013

Applied Physics Letters

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This paper demonstrates that polarization plays an important role in the formation of interference patterns, pattern contrasts, and periods in four-beam interference lithography. Three different polarization modes are presented to study the effects of polarization on four-beam laser interference based on theoretical analysis, simulations, and experiments. A four-beam laser interference system was set up to modify the silicon surface. It was found that the secondary periodicity or modulation was the result of the misaligned or unequal incident angles only in the case of the TE-TE-TM-TM mode. The resulting patterns have shown a good correspondence with the theoretical analysis and simulations.

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“…In comparison to these methods laser interference lithography offers the opportunity for fast and flexible realization of periodic structures over macroscopic area in a single processing step [4][5][6][7][8]. In laser interference lithography periodic structures are created either in a photoresist layer covering the material surface [8] or, when high energy lasers are used, directly in the material of interest [4][5][6][7]. In the latter technique, called direct laser interference lithography (DLIL), the superposition of coherent laser beams, originating from the same source, locally modifies the properties of irradiated materials.…”

Section: Introductionmentioning

confidence: 99%

Micropatterning of Silicon Surface by Direct Laser Interference Lithography

et al. 2012

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Direct laser interference lithography is a new and low cost technique which can generate the line-or dot-like periodic patterns over large areas. In the present work, we report on direct fabrication of micrometer structures on Si surface. In the experiments the pulsed high power Nd:YAG laser operating at 1064 nm wavelength was used. Two-beam configuration with an angle of incidence of 40• was employed and different laser fluences up to 2.11 J/cm 2 were tested. Areas about 1 cm in diameter have been processed with a single pulse of 10 ns. The laser treated samples were analyzed by atomic force microscopy to investigate the surface topography and to measure the size and depth of the achieved structures. We observed periodic line-like arrays with grating period of the order of 1 µm.

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Direct Laser Interference Patterning: Theory and Application

Cited by 28 publications

References 6 publications

Optical Diffraction Strain Sensor Prepared by Interference Lithography

Optical Diffraction Strain Sensor Prepared by Interference Lithography

Effects of polarization on four-beam laser interference lithography

Micropatterning of Silicon Surface by Direct Laser Interference Lithography

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