2006
DOI: 10.1016/j.jallcom.2005.12.053
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Diffusion of Mn in gallium arsenide

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Cited by 8 publications
(11 citation statements)
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References 10 publications
(11 reference statements)
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“…The Be profiles for samples annealed at different temperatures (see Figs 1b and 2) all exhibit a visible drop (kink). Similar behavior was already observed for diffusion of Zn in GaAs [22], Zn in InP [23], and Mn in GaAs [24]. As shown, the change in the SIMS profile shape indicates that the diffusion coefficient depends on the concentration of the studied element.…”
Section: Resultssupporting
confidence: 82%
See 1 more Smart Citation
“…The Be profiles for samples annealed at different temperatures (see Figs 1b and 2) all exhibit a visible drop (kink). Similar behavior was already observed for diffusion of Zn in GaAs [22], Zn in InP [23], and Mn in GaAs [24]. As shown, the change in the SIMS profile shape indicates that the diffusion coefficient depends on the concentration of the studied element.…”
Section: Resultssupporting
confidence: 82%
“…Zn in InP [23], and Mn in GaAs [24]. As shown, the change in the SIMS profile shape indicates that the diffusion coefficient depends on the concentration of the studied element.…”
Section: Discussionmentioning
confidence: 78%
“…18 In the zincblend lattice there are three possible interstitial sites: two tetrahedral sites, which are surrounded by four cations or four anions, and one hexagonal site. Recently, Jakieła et al proposed that the Mn atoms are diffused into GaAs through interstitial sites.…”
Section: Resultsmentioning
confidence: 99%
“…It is supposed that these obtained Mn 2p XPS and 3d PDOS contain some contribution from interstitial Mn atoms (Mn I ). Recently, Jakie la et al proposed that the Mn atoms are diffused into GaAs through interstitial sites [18]. In the zinc-blende lattice there are three possible interstitial sites, two tetrahedral sites, which are surrounded by four cations or four anions, and one hexagonal site [19].…”
mentioning
confidence: 99%
“…Such characteristic profiles appear in the case of various dopants in various crystal materials and indicate that the atom diffusion is determined by an additional factor reducing the atom mobility [59][60][61][62]. The influencing factors can be level of dopant trapping defects resulting from the Fermi level, the charge state of defects affecting they mobility, which may also result from the Fermi level or as in the case SiC, the dopant forming complexes with diffusing atoms.…”
Section: Hydrogen Properties In Sicmentioning
confidence: 99%