Development of X-Shape Filtered Arc Deposition (X-FAD) Apparatus and DLC/Cr Film Preparation

Abstract

Tetrahedral amorphous-carbon (ta-C) without hydrogen is the hardest in diamond-like carbon (DLC), and expected of the application to coating on dry cutting tool for aluminum. The only method to prepare ta-C on an industrial scale is cathodic vacuum arc deposition. We have been developed T-shape filtered arc deposition (T-FAD) system with efficient droplet reduction. However, ta-C usually requires a binding interlayer between the workpiece and film, since the internal stress of the film is very high and adhesion to the substrate is not good. In the present study, in order to prepare DLC and metal film on the superhard alloy depositing from same direction, we developed on X-shape filtered arc deposition (X-FAD) apparatus. First of all, we verified the droplet reduction function, and then the appropriate duct bias voltages and deposition rate. DLC was also prepared with substrate heating. By considering and following these results, 1 a thick ta-C film was prepared on a superhard alloy with interlayer by X-FAD.